Microstructure and Properties of A-Site Doping Bi4-xYxTi3O12 Ferrroelectric Thin Films

Article Preview

Abstract:

s. Yttium-substituted bismuth titanate (Bi4-xYxTi3O12, BYT) thin films were deposited on the (111)Pt/Ti/SiO2(100) substrates by a modified Sol-Gel process and studied in this work in terms of Y3+-modified microstructure and phase development as well as ferroelectric properties. With the aid of the fist-principle, the position of Y3+ substitution for Bi3+ on the microstructure of BYT was studied.The phase change in the formation of BYT crystalline and the effect of Y3+ substitution for Bi3+ on the microstructure of BYT was studiedbyXRD. The results showed that the optimal properties of the obtained BYT ferroelectric thin films were x:0.6. The ferroelectric properties of the films were also investigated. When the Y-substituted content x was equal to 0.6, the remnant polarization was the largest. The remnant polarization 2Pr value was equal to 16.02μC/cm2and the coercive field Ec value was 88 kV/cm.

You might also be interested in these eBooks

Info:

Periodical:

Pages:

171-175

Citation:

Online since:

March 2015

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2015 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

* - Corresponding Author

[1] H. M. Duiker, P. D. Beale, J. F. Scott, C. A. Paz de Araujo, B. M. Melnick,J. D. Cuchiaro, and L. D. McMillan, J. Appl. Phys. 68 (1990) 5783.

DOI: 10.1063/1.346948

Google Scholar

[2] J. F. Scott and C. A. Paz de Araujo, Science 246(1989) 1400.

Google Scholar

[3] O. Auciello, J. F. Scott, and R. Ramesh, Phys. Today 51(7) (1998) 22.

Google Scholar

[4] B. Aurivillius, Ark. Kemi 1(1949) 463.

Google Scholar

[5] Kan-HaoXue, Carlos A. Paz de Araujo, and JolantaCelinska. A comparative study on Bi4Ti3O12 and Bi3. 25La0. 75Ti3O12 ferroelectric thinfilms derived by metal organic decomposition,J. Appl. Phys. 107(2010) 104123.

Google Scholar

[6] B. H. Park, B. H. Kang, S. D. Bu, T. W. Noh, J. Lee, and W Jo, Lanthanum- substituted bismuth titanate for use in non-volatile memories. Nature 374(1995) 627-629.

DOI: 10.1038/44352

Google Scholar

[7] U. Chon, H. M. J. ang, M. G. Kim, and C. H. Chang, Layered perovskites with giant spontaneous polarizations for nonvolatile memories. Phys. Rev. Lett. 89 (2002) 087601.

DOI: 10.1103/physrevlett.89.087601

Google Scholar

[8] H . N. Lee and D. Hesse, Anisotropic ferroelectric properties of epitaxially twinned Bi3. 25La0. 75Ti3O12 films. Appl. Phys. Lett. 80(2002) 1040-1042.

DOI: 10.1063/1.1447321

Google Scholar

[9] H. C. Liu, B. Wang, R. Wang, and X. R. Liu, Preparation and electric characteristics of gadolinium-substituted bismuth titanate ferroelectric thin films. Mat. Lett. 61 (2007) 2457-2459.

DOI: 10.1016/j.matlet.2006.09.037

Google Scholar

[10] Ming-Cheng Kao, Hone-Zern Chen, San-Lin Young, The microstructure and ferroelectric properties of Sm and Ta-doped bismuth titanateferroelectric thin films. Thin Solid Films 528 (2013) 143–146.

DOI: 10.1016/j.tsf.2012.10.074

Google Scholar

[11] J Zhang, X.L. Wang, S.X. Dou, Ferroelectric properties of Bi3. 25Sm0. 75V0. 02T2. 98O12 thin film at elevated temperature,Appl. Phys. Lett. 90 (2007) 222902.

DOI: 10.1063/1.2743910

Google Scholar

[12] S.W. Kang, S.W. Rhee, Deposition of Bi4−xLaxTi3O12 films by direct liquid injection-metalorganic chemical vapor deposition. J. Vac. Sci. Technol. A 21 (2003) 340.

DOI: 10.1116/1.1532739

Google Scholar

[13] S.W. Kang, S.W. Rhee, Evaluation of Precursors for DLI MOCVD of Ferroelectric BLT. J. Electrochem. Soc. 150 (2003) C573.

DOI: 10.1149/1.1595661

Google Scholar

[14] S.S. Kim, J.C. Bae, W.J. Kim, Fabrication and ferroelectric studies of (Bi, Gd)4Ti3O12 thin films grown on Pt/Ti/SiO2/Si and p-type Si substrates, J. Cryst. Growth 274 (2005) 394.

DOI: 10.1016/j.jcrysgro.2004.10.012

Google Scholar

[15] J.S. Kim, S.S. Kim, Ferroelectric properties of Nd-substituted bismuth titanate thin films processed at low temperature, Appl. Phys. A 81 (2005) 1427.

DOI: 10.1007/s00339-004-3190-0

Google Scholar