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Development of Precious Metal and its Alloy Sputtering Targets with High Performance

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Abstract:

High-purity precious metal and its alloy targets make a very important role in semiconductor manufacturing. In this paper, the preparation methods of high performance sputtering targets (including silver, platinum and its alloy, ruthenium materials) for advanced semiconductor manufacturing were introduced. The relationships between deposited film behaviors and sputtering target properties in some applications were also discussed. In order to acquire high quality thin film, the properties of sputtering target such as density, alloy composition homogeneity, grain size and uniformity et al. have to be well controlled by proper fabrication techniques.

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Periodical:

Materials Science Forum (Volume 815)

Pages:

61-66

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.815.61

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Online since:

March 2015

Authors:

Jin Jiang He*, Shu Qin Liu, Jun Feng Luo, Yue Wang, Yan Gao, Xiao Dong Xiong

Keywords:

High Purity, Precious Metal, Semiconductor, Sputtering Target

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© 2015 Trans Tech Publications Ltd. All Rights Reserved

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