New Method for Synthesis of Hard Coatings Using Pulsed Bombardment with High-Energy Gas Atoms

Abstract:

For deposition of hard coatings is used a source of metal atoms accompanied by high-energy gas atoms. The metal atoms are produced due to sputtering a flat rectangular target in low pressure magnetron discharge. The gas atoms with energy up to 30 keV are produced due to charge exchange collisions of accelerated ions in space charge sheaths near the surfaces of a grid parallel to the target. The ions are extracted from the discharge plasma and accelerated by high-voltage pulses applied to the grid. The metal atoms pass through the grid and deposit on the products. Conjunction of their trajectories with those of gas atoms bombarding the growing coating allows synthesis of the coatings on rotating dielectric products. Mixing by high-energy gas atoms of the coating atoms and atoms of the product material in its surface layer improves the coating adhesion.

• Periodical: Materials Science Forum (Volume 876)
• Pages: 14-24
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.876.14
• Online since: October 2016
• Authors: Abdumalik Rakhimovich Seitkulov, S.N. Grigoriev, Alexander Sergeevich Metel*, Marina Volosova, Yury Andreevich Melnik
• Keywords: Adhesion Improvement, Coating Synthesis, Fast Gas Atoms, Magnetron Sputtering, Metal Atoms, Surface Layer

References

[1] S. Grigoriev, A. Metel, Plasma- and beam-assisted deposition methods, in: Nanostructured thin films and nanodispersion strengthened coatings. Kluwer Academic Publishers, Boston, Dordrecht, London, 2004, p.147–154.

DOI: 10.1007/1-4020-2222-0_14

[2] J. Musil, Low-pressure magnetron sputtering, Vacuum. 50 (1998) 363-372.

DOI: 10.1016/s0042-207x(98)00068-2

[3] J. Amano, R. Lawson, Thin film deposition using low energy ion beams (3) Mg+ ion-beam deposition and analysis of deposits, J. Vac. Sci. Technol. 14 (1977) 695-698.

DOI: 10.1116/1.569185

[4] C. Ruset, E. Grigore, The influence of ion implantation on the properties of titanium nitride layer deposited by magnetron sputtering, Surf. Coat. Technol. 156 (2002) 159-161.

DOI: 10.1016/s0257-8972(02)00121-4

[5] C. Ruset, E. Grigore, G.A. Collins, K.T. Short, F. Rossi, N. Gibson, H. Dong, T. Bell, Characteristics of the Ti2N layer produced by an ion assisted deposition method, Surf. Coat. Technol. 174/175 (2003) 698-703.

DOI: 10.1016/s0257-8972(03)00411-0

[6] E. Grigore, C. Ruset, K.T. Short, D. Hoeft, H. Dong, X.Y. Li, T. Bell, In situ investigation of the internal stress within the nc-Ti2N/nc-TiN nanocomposite coatings produced by a combined magnetron sputtering and ion implantation method, Surf. Coat. Technol. 200 (2005).

DOI: 10.1016/j.surfcoat.2005.02.118

[7] H.R. Kaufman, Broad-beam ion sources, Rev. Sci. Instrum. 61 (1990) 230-235.

[8] N.V. Gavrilov, G.A. Mesyats, G.V. Radkovskii, V.V. Bersenev, Development of technological sources of gas ions on the basis of hollow-cathode glow discharges, Surf. Coat. Technol. 96 (1997) 81-88.

DOI: 10.1016/s0257-8972(97)00096-0

[9] A.S. Metel, Beams of fast neutral atoms and molecules in low-pressure gas-discharge plasma, Plasma Physics Reports. 38 (2012) 254-262.

DOI: 10.1134/s1063780x12020080

[10] A.S. Metel, S.N. Grigoriev, Yu.A. Melnik, V.P. Bolbukov, Broad beam sources of fast molecules with segmented cold cathodes and emissive grids, Instruments and Experimental Techniques. 55 (2012) 122-130.

DOI: 10.1134/s0020441211060170

[11] A.S. Metel, Yu.A. Melnik, V.V. Panin, Non-self-sustained glow discharge with electrostatic confinement of electrons sustained by a fast neutral molecule beam, Plasma Physics Reports. 37 (2011) 357-365.

DOI: 10.1134/s1063780x11040088

[12] A.F. Cakir, A. Metel, M. Urgen, S. Grigoriev, Arc-PVD Coating of Metallic and Dielectric Substrates Using Neutral Molecular Beam Source Pretreatment, Galvanotechnik. 91 (2000) 768-776.

[13] S.N. Grigoriev, Yu. A. Melnik, A.S. Metel, V.V. Panin, and V.V. Prudnikov, A compact vapor source of conductive target material sputtered by 3-keV ions at 0. 05-Pa pressure, Instruments and Experimental Techniques. 52 (2009) 731-737.

DOI: 10.1134/s0020441209050170

[14] A. Metel, V. Bolbukov, M. Volosova, S. Grigoriev, Yu. Melnik, Source of metal atoms and fast gas molecules for coating deposition on complex shaped dielectric products, Surf. Coat. Technol. 225 (2013) 34-39.

DOI: 10.1016/j.surfcoat.2013.03.013

[15] A.S. Metel, Characteristics of the detection of a quasi-stationary state of the heavy-current glow discharge with a hollow-space cathode at low gas pressure, Sov. Phys. -Tech. Phys. 31 (1986) 1395-1405.

[16] M. Kaminsky, Atomic and Ionic Impact Phenomena on Metal Surfaces, Springer, Verlag Berlin Heidelberg, (1965).

[17] M.B. Guseva, V.G. Babaev, V.V. Khvostov, N.F. Savchenko Controlled Formation Process and Structure of thin Films. Ion-Assisted Processes, Nanotekhnol.: Razrab. Primen. - XXI Vek. 1 (2010) 15-28[in Russian].

[18] A.S. Metel, Yu.A. Melnik, V.P. Bolbukov, A source of pulsed beams of high-energy gas molecules, Vestnik MSTU STANKIN, 35 (2015) 74-77.

[19] A.V. Phelps, Cross sections and swarm coefficients for nitrogen ions and neutrals in N2 and argon ions and neutrals in Ar for energies from 0. 1 eV to 10 keV, J. Phys. Chem. Ref. Data. 20 (1991) 557-573.

DOI: 10.1063/1.555889

[20] A.S. Metel, Beam and plasma technologies for synthesis of nanostructured coatings with enhanced cyclical fracture toughness and hardness, Vestnik MSTU STANKIN, 34 (2015) 63-66.