Inelastic Relaxation in Tin Dioxide Thin Films
Internal friction results obtained in thin SnO2 films produced by reactive magnetron sputtering (thickness of the film ~ 1 μm) and by the dehydration of water solution of tin salts (thickness of the film ~ 10 μm) are reported. It is suggested that internal friction peak observed in SnO2 films at around 170 oC is caused by relaxation processes on grain boundaries (average grain size is 20 nm). The investigation of internal friction in SnO2 films can yield new information about the structure of thin films.
B.M. Darinskii and L.B. Magalas
V.I. Mitrokhin et al., "Inelastic Relaxation in Tin Dioxide Thin Films", Solid State Phenomena, Vol. 115, pp. 275-278, 2006