Inelastic Relaxation in Tin Dioxide Thin Films

V.I. Mitrokhin; S.I. Rembeza; E.S. Rembeza; A.A. Rudenko

doi:10.4028/www.scientific.net/SSP.115.275

Paper Titles

The Influence of Mechanical Deformation on the Optical Properties of Laminated As₂S₃, GeSe₂ and As₂Se₃ Crystals
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Memory Effects in Quantum Theory of Relaxation
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Relaxation of Highly Non Equilibrium Charge Carriers in Crystals by Low-Energy Electron Influence
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The Self-Organisation of Tetrahedrally Close-Packed Structures in Magnetic Nanocrystalline Tb-Fe and Co-Pd Films
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Inelastic Relaxation in Tin Dioxide Thin Films
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Specific Features of Brillouin Spectra at a High-Temperature Phase Transition in Cs₅H₃(SO₄)₄xnH₂O Crystals
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Zero-Point Drift in Low-Frequency Mechanical Spectroscopy
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Extrinsic Resonance Effects in a Subresonant Mechanical Spectrometer
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On-Line Control of Harmonic Oscillations in a Low-Frequency Resonant Mechanical Spectrometer
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HomeSolid State PhenomenaSolid State Phenomena Vol. 115Inelastic Relaxation in Tin Dioxide Thin Films

Inelastic Relaxation in Tin Dioxide Thin Films

Abstract:

Internal friction results obtained in thin SnO2 films produced by reactive magnetron sputtering (thickness of the film ~ 1 μm) and by the dehydration of water solution of tin salts (thickness of the film ~ 10 μm) are reported. It is suggested that internal friction peak observed in SnO2 films at around 170 oC is caused by relaxation processes on grain boundaries (average grain size is 20 nm). The investigation of internal friction in SnO2 films can yield new information about the structure of thin films.

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Periodical:

Solid State Phenomena (Volume 115)

Pages:

275-278

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.115.275

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Online since:

August 2006

Authors:

V.I. Mitrokhin, S.I. Rembeza, E.S. Rembeza, A.A. Rudenko

Keywords:

Internal Friction, Polycrystalline Tin Dioxide, Thin Film

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