Inelastic Relaxation in Tin Dioxide Thin Films

Abstract:

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Internal friction results obtained in thin SnO2 films produced by reactive magnetron sputtering (thickness of the film ~ 1 μm) and by the dehydration of water solution of tin salts (thickness of the film ~ 10 μm) are reported. It is suggested that internal friction peak observed in SnO2 films at around 170 oC is caused by relaxation processes on grain boundaries (average grain size is 20 nm). The investigation of internal friction in SnO2 films can yield new information about the structure of thin films.

Info:

Periodical:

Solid State Phenomena (Volume 115)

Edited by:

B.M. Darinskii and L.B. Magalas

Pages:

275-278

DOI:

10.4028/www.scientific.net/SSP.115.275

Citation:

V.I. Mitrokhin et al., "Inelastic Relaxation in Tin Dioxide Thin Films", Solid State Phenomena, Vol. 115, pp. 275-278, 2006

Online since:

August 2006

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Price:

$35.00

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