The Heat Treatment Characteristics of Hydroxyapatite Thin Films Deposited by RF Sputtering

Abstract:

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RF sputtering process was applied to produce thin hydroxyapatite(HAp, Ca10(PO4)6(OH)2) films on Ti-6Al-4V alloy substrates. The effects of different heat treatment conditions on the bonding strength between HAp thin films and Ti-6Al-4V alloy substrates were studied. Before deposition, the Ti-6Al-4V alloy substrates were heat treated for 1hr at 850°C under 3.0×10-3torr, and after deposition, the HAp thin films were heat treated for 1hr at 400°C, 600°C and 800°C under the atmosphere, and analyzed optical microscope, FESEM, FTIR, XRD, nano-indentor, micro-vickers hardness, respectively. Experimental results represented that the HAp thin films on the heat treated substrates had higher hardness than none-heat treated substrates before the deposition.

Info:

Periodical:

Solid State Phenomena (Volumes 124-126)

Edited by:

Byung Tae Ahn, Hyeongtag Jeon, Bo Young Hur, Kibae Kim and Jong Wan Park

Pages:

1433-1436

DOI:

10.4028/www.scientific.net/SSP.124-126.1433

Citation:

C. H. Jung et al., "The Heat Treatment Characteristics of Hydroxyapatite Thin Films Deposited by RF Sputtering", Solid State Phenomena, Vols. 124-126, pp. 1433-1436, 2007

Online since:

June 2007

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$35.00

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