The Heat Treatment Characteristics of Hydroxyapatite Thin Films Deposited by RF Sputtering
RF sputtering process was applied to produce thin hydroxyapatite(HAp, Ca10(PO4)6(OH)2) films on Ti-6Al-4V alloy substrates. The effects of different heat treatment conditions on the bonding strength between HAp thin films and Ti-6Al-4V alloy substrates were studied. Before deposition, the Ti-6Al-4V alloy substrates were heat treated for 1hr at 850°C under 3.0×10-3torr, and after deposition, the HAp thin films were heat treated for 1hr at 400°C, 600°C and 800°C under the atmosphere, and analyzed optical microscope, FESEM, FTIR, XRD, nano-indentor, micro-vickers hardness, respectively. Experimental results represented that the HAp thin films on the heat treated substrates had higher hardness than none-heat treated substrates before the deposition.
Byung Tae Ahn, Hyeongtag Jeon, Bo Young Hur, Kibae Kim and Jong Wan Park
C. H. Jung et al., "The Heat Treatment Characteristics of Hydroxyapatite Thin Films Deposited by RF Sputtering", Solid State Phenomena, Vols. 124-126, pp. 1433-1436, 2007