Characteristics of Inductive Coupled Plasma with Internal Linear Antenna Using Multi-Polar Magnetic Field for FPD Processing

Jong Hyeuk Lim; Kyong Nam Kim; Geun Young Yeom

doi:10.4028/www.scientific.net/SSP.124-126.271

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HomeSolid State PhenomenaSolid State Phenomena Vols. 124-126Characteristics of Inductive Coupled Plasma with...

Characteristics of Inductive Coupled Plasma with Internal Linear Antenna Using Multi-Polar Magnetic Field for FPD Processing

Abstract:

An internal linear inductive antenna referred to as “double comb-type antenna” was used for a large-area plasma source with the substrate area of 880mm × 660mm and the effects of multi-polar magnetic field applied by inserting permanent magnets parallel to the linear internal antennas on the plasma characteristics were investigated. By applying the multi-polar magnetic field, high density plasmas on the order of 3.2 × 1011-3 which is 50% higher than that obtained for the source without multi-polar magnetic field could be obtained at the RF power of 5000W. Also stable impedance matching with a low Q-factor of the plasma system could be obtained. The application of the multi-polar magnetic field not only increased the plasma density but also improved the plasma uniformity (less than 3%) within the 880mm × 660mm processing area.

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Solid State Phenomena (Volumes 124-126)

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271-274

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https://doi.org/10.4028/www.scientific.net/SSP.124-126.271

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Online since:

June 2007

Authors:

Jong Hyeuk Lim, Kyong Nam Kim, Geun Young Yeom

Keywords:

Inductively Coupled Plasma, Internal Linear Antenna, Large Area

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