Characteristics of Inductive Coupled Plasma with Internal Linear Antenna Using Multi-Polar Magnetic Field for FPD Processing

Abstract:

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An internal linear inductive antenna referred to as “double comb-type antenna” was used for a large-area plasma source with the substrate area of 880mm × 660mm and the effects of multi-polar magnetic field applied by inserting permanent magnets parallel to the linear internal antennas on the plasma characteristics were investigated. By applying the multi-polar magnetic field, high density plasmas on the order of 3.2 × 1011-3 which is 50% higher than that obtained for the source without multi-polar magnetic field could be obtained at the RF power of 5000W. Also stable impedance matching with a low Q-factor of the plasma system could be obtained. The application of the multi-polar magnetic field not only increased the plasma density but also improved the plasma uniformity (less than 3%) within the 880mm × 660mm processing area.

Info:

Periodical:

Solid State Phenomena (Volumes 124-126)

Edited by:

Byung Tae Ahn, Hyeongtag Jeon, Bo Young Hur, Kibae Kim and Jong Wan Park

Pages:

271-274

DOI:

10.4028/www.scientific.net/SSP.124-126.271

Citation:

J. H. Lim et al., "Characteristics of Inductive Coupled Plasma with Internal Linear Antenna Using Multi-Polar Magnetic Field for FPD Processing", Solid State Phenomena, Vols. 124-126, pp. 271-274, 2007

Online since:

June 2007

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Price:

$35.00

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