Characteristics of Inductive Coupled Plasma with Internal Linear Antenna Using Multi-Polar Magnetic Field for FPD Processing
An internal linear inductive antenna referred to as “double comb-type antenna” was used for a large-area plasma source with the substrate area of 880mm × 660mm and the effects of multi-polar magnetic field applied by inserting permanent magnets parallel to the linear internal antennas on the plasma characteristics were investigated. By applying the multi-polar magnetic field, high density plasmas on the order of 3.2 × 1011-3 which is 50% higher than that obtained for the source without multi-polar magnetic field could be obtained at the RF power of 5000W. Also stable impedance matching with a low Q-factor of the plasma system could be obtained. The application of the multi-polar magnetic field not only increased the plasma density but also improved the plasma uniformity (less than 3%) within the 880mm × 660mm processing area.
Byung Tae Ahn, Hyeongtag Jeon, Bo Young Hur, Kibae Kim and Jong Wan Park
J. H. Lim et al., "Characteristics of Inductive Coupled Plasma with Internal Linear Antenna Using Multi-Polar Magnetic Field for FPD Processing", Solid State Phenomena, Vols. 124-126, pp. 271-274, 2007