Optical and Electrical Properties of ITO/Ag/ITO Multilayer Thin Films Deposited by D.C. Magnetron Sputtering
ITO monolayer and ITO/Ag/ITO multilayer thin films are prepared by D.C. magnetron sputtering method, optical and electrical properties were estimated with different crystalline properties and microstructures. The coated Ag layer thickness was around 50 , and the surface of ITO/Ag/ITO thin film had the very fine island morphology. The growth of columnar phase was inhibited, and most of phases were amorphous. The carrier concentration increased above 10 times because of the effect of Ag layer, and the observed sheet resistance gave much lower value of below 4 / compared to that of coated crystalline ITO thin film that was 10 / , and the transmittance was 80%.
Byung Tae Ahn, Hyeongtag Jeon, Bo Young Hur, Kibae Kim and Jong Wan Park
Y. L. Choi and S. H. Kim, "Optical and Electrical Properties of ITO/Ag/ITO Multilayer Thin Films Deposited by D.C. Magnetron Sputtering", Solid State Phenomena, Vols. 124-126, pp. 403-406, 2007