For Libraries For Publication Open Access Downloads About Us Contact Us
Paper Titles
Study on Resist Removal Using Electrolyzed Sulfuric Acid Solution in Comparison with SPM
p.109
Using the Background Signal of a Light Scattering Tool for I/I Photo Resist Strip Optimization and Monitoring
p.113
Wafer Edge Bead Cleaning with Laser Radiation and Reactive Gas
p.117
Effects of Interfacial Strength and Dimension of Structures on Physical Cleaning Window
p.123
The Influence of Liquid Media on the Fracture Strength of Polysilicon Nanostructures
p.127
Comparisons of Various Physical Cleaning
p.131
Effects of Target Compliance on a High-Speed Droplet Impact
p.137
Order Estimation of Physical Processes in Dynamics of Steam-Water Mixed Spray Cleaning Technique
p.141
Thermomechanical Resist Removal-Cleaning System Using Cryogenic Micro-Slush Jet
p.145

The Influence of Liquid Media on the Fracture Strength of Polysilicon Nanostructures

Article Preview

Abstract:

The mechanical stability of nanostructures depends on the surrounding medium. Their stability was probed by lateral force microscopy in liquid media. Previously reported data on water and isopropanol showed an increase in the fracture strength for the latter. Further tests with other alcohols (ethanol, 1-butanol) also showed an increasing strength. The interface between the liquid and the surface is the decisive factor for the influence of the media. When altering the interface with a cationic surfactant or a self-assembled monolayer, an increase of the fracture force by 100 % compared to de-ionized water could be measured.

You might also be interested in these eBooks
Ultra Clean Processing of Semiconductor Surfaces X View Preview

Info:

Periodical:

Solid State Phenomena (Volume 187)

Pages:

127-130

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.187.127

Citation:

Cite this paper

Online since:

April 2012

Authors:

Daniel Peter, Michael Dalmer, Alfred Lechner, Alexander M. Gigler, Robert W. Stark, Wolfgang Bensch

Keywords:

Atomic Force Microscopy (AFM), Damage, Fracture Strength, Pattern Collapse

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 2012 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

References

[1] C. De Marco, K. Wostyn, T. Bearda, K. -I. Sano, K. Kenis, T. Janssens, L. Leunissen, A. Eitoku, and P. Mertens, ECS Trans., 11 (2), 2007, p.87.

DOI: 10.1149/1.2779366

Google Scholar

[2] A. Kawai and Y. Kaneko, Jpn. J. Appl. Phys. 39, 2000, p.1426.

Google Scholar

[3] T. Kim, K. Wostyn, P. Mertens, A. Busnainan, and J. Park, ECS Trans., 11 (2), 2007, p.123.

Google Scholar

[4] D. Peter, M. Dalmer, H. Kruwinus, A. Lechner, L. Archer, E. Gaulhofer, and W. Bensch, ECS Trans., 13 (2), 2008, p.323.

DOI: 10.1149/1.2908645

Google Scholar

[5] K. Wostyn, T.G. Kim, P. W. Mertens, and J.G. Park, Solid State Phenomena, 145-146, 2009, p.55.

Google Scholar

[6] D. Peter, F. Holsteyns, M. Dalmer, H. Kruwinus, A. Lechner, and W. Bensch, ECS Trans., 25 (5), 2009, p.248.

DOI: 10.1149/1.3202659

Google Scholar

[7] T.G. Kim, K. Wostyn, T. Bearda, J.G. Park, P. Mertens, and M. Heyns, ECS Trans., 25 (5), 2009, p.203.

DOI: 10.1149/1.3202654

Google Scholar

[8] D. Peter, M. Dalmer, H. Kruwinus, A. Lechner, L. Archer, E. Gaulhofer, A. M. Gigler, R. W. Stark, and W. Bensch, ECS Trans., 16 (40), 2008, p.13.

DOI: 10.1149/1.3108349

Google Scholar

[9] Z. Bi, W. Liao, and L. Qi, Appied Surface Science, 221, 2004, p.25.

Google Scholar

[10] J. Han, J. M. Yang, S. C. Shin, Y. Kim, and S. Kang, IEEE Transactions on Magnetics, 45 (5), 2009, p.2288.

Google Scholar

[11] T. A. Michalske and B. C. Bunker, J. Appl. Phys., 56 (10), 1984, p.2686.

Google Scholar

© 2025 Trans Tech Publications Ltd. All rights are reserved, including those for text and data mining, AI training, and similar technologies. For open access content, terms of the Creative Commons licensing CC-BY are applied.
Scientific.Net is a registered trademark of Trans Tech Publications Ltd.