Using the Background Signal of a Light Scattering Tool for I/I Photo Resist Strip Optimization and Monitoring

Sandip Halder; Rita Vos; Masayuki Wada; Martine Claes; Karine Kenis; Paul W. Mertens; Prasanna Dighe; Sanda Radovanovic; Gavin Simpson; Roger Sonnemans

doi:10.4028/www.scientific.net/SSP.187.113

Paper Titles

Non-Oxidizing Solvent-Based Strip of Ion Implanted Photoresist
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All-Wet, Metal-Compatible High-Dose-Implanted Photoresist Strip
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Applicable Solvent Photoresist Strip Process for High-K/Metal Gate
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Study on Resist Removal Using Electrolyzed Sulfuric Acid Solution in Comparison with SPM
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Using the Background Signal of a Light Scattering Tool for I/I Photo Resist Strip Optimization and Monitoring
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Wafer Edge Bead Cleaning with Laser Radiation and Reactive Gas
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Effects of Interfacial Strength and Dimension of Structures on Physical Cleaning Window
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The Influence of Liquid Media on the Fracture Strength of Polysilicon Nanostructures
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Comparisons of Various Physical Cleaning
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HomeSolid State PhenomenaSolid State Phenomena Vol. 187Using the Background Signal of a Light Scattering...

Using the Background Signal of a Light Scattering Tool for I/I Photo Resist Strip Optimization and Monitoring

Abstract:

With the continuous decrease of feature size of semiconductor devices new process related challenges must be overcome continuously. One of the key issues for technology development is to have the proper metrology in place to evaluate the myriad process steps fast and accurately. Sometimes the mere existence of a particular metrology is not enough because of cost and throughput issues. The goal of this paper is to show that simply by monitoring the background signal of a light scattering tool, certain process optimizations and monitoring can be done much faster while bringing down the cost significantly. We focus particularly on post I/I strip optimization in this paper.