Non-Oxidizing Solvent-Based Strip of Ion Implanted Photoresist

Diana Tsvetanova; Rita Vos; K. Vanstreels; D. Radisic; R. Sonnemans; Ivan Berry III; Carlo Waldfried; David Mattson; J. de Luca; Guy Vereecke; Paul W. Mertens; T.N. Parac-Vogt; Marc Heyns

doi:10.4028/www.scientific.net/SSP.187.97

Paper Titles

Elucidation of an Isopropyl Alcohol (IPA) Adsorption Phenomenon on a Wafer Surface for Achieving an Ultra-Clean and IPA-Saving Drying Process in the Batch Cleaning System
p.79

Measurement of Adhesion Force of Resist to Wafer by Using SAICAS: Characteristics of Lift-Off of Resist by Steam-Water Mixed Spray
p.85

High Temperature SPM Process Study for Stripping of Implanted Photoresist
p.89

Study of Controlled Oxygen Diffusion Approaches for Advanced Photoresist Strip
p.93

Non-Oxidizing Solvent-Based Strip of Ion Implanted Photoresist
p.97

All-Wet, Metal-Compatible High-Dose-Implanted Photoresist Strip
p.101

Applicable Solvent Photoresist Strip Process for High-K/Metal Gate
p.105

Study on Resist Removal Using Electrolyzed Sulfuric Acid Solution in Comparison with SPM
p.109

Using the Background Signal of a Light Scattering Tool for I/I Photo Resist Strip Optimization and Monitoring
p.113

HomeSolid State PhenomenaSolid State Phenomena Vol. 187Non-Oxidizing Solvent-Based Strip of Ion Implanted...

Non-Oxidizing Solvent-Based Strip of Ion Implanted Photoresist

Abstract:

The removal of ion implanted photoresist (II-PR) after implantation of ultra shallow extension and halo regions is considered as one of the most challenging front-end-of-line (FEOL) processing steps for 32nm and beyond CMOS technology nodes. Commonly used resist strip processes such as fluorine-based dry plasma ash and hot sulfuric/peroxide mixtures induce unacceptable levels of oxidation and material loss [1-.

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Periodical:

Solid State Phenomena (Volume 187)

Pages:

97-100

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.187.97

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Online since:

April 2012

Authors:

Diana Tsvetanova, Rita Vos, K. Vanstreels, D. Radisic, R. Sonnemans, Ivan Berry III, Carlo Waldfried, David Mattson, J. de Luca, Guy Vereecke, Paul W. Mertens, T.N. Parac-Vogt, Marc Heyns

Keywords:

Non-Oxidizing Ambient, Organic Solvent, Resist Removal, UV Treatment

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References

[1] G. Mannaert, M.R. Baklanov, D. Goossens, J. Vertommen and W. Boullart, Solid State Phenomena, 134 (2008), 113.

DOI: 10.4028/www.scientific.net/ssp.134.113

Google Scholar

[2] D.P. Brunco, B. De Jaeger, G. Eneman, J. Mitard, G. Hellings, A. Satta,V. Terzieva, L. Souriau, F.E. Leys, G. Pourtois, M. Houssa, G. Winderickx, E. Vrancken, S. Sioncke, K. Opsomer, G. Nicholas, M. Caymax, A. Stesmans, J. Van Steenbergen, P.W. Mertens, M. Meuris and M.M. Heyns, J. Electrochem. Soc., 155 (7) (2008).

DOI: 10.1149/1.2919115

Google Scholar

[3] S. Sioncke, D.P. Brunco, M. Meuris, O. Uwamahoro, J. Van Steenbergen, E. Vrancken, M.M. Heyns, Solid State Phenomena, 145-146 (2009), 203.

DOI: 10.4028/www.scientific.net/ssp.145-146.203

Google Scholar

[4] R. Vos, S. Arnauts, I. Bovie, B. Onsia, S. Garaud, K. Xu, Y. Hong Yu, S. Kubicek, E. Rohr, T. Schram, A. Veloso, T. Conard, L.H.A. Leunissen and P.W. Mertens, ECS transactions, 11 (4) (2007), 275.

DOI: 10.1149/1.2779567

Google Scholar

[5] D. Tsvetanova, R. Vos, G. Vereecke, F. Clemente, K. Vanstreels, T. Conard, A. Franquet, T.N. Parac-Vogt, P.W. Mertens and M.M. Heyns, ECS transactions, 25 (5) (2009), 187.

DOI: 10.1149/1.3202652

Google Scholar

[6] R. Vos, G. Mannaert, S. Halder, M. Wada, R. Sonnemans, D. Tsvetanova, N. Valckx, K. Vanstreels, T. Conard and P.W. Mertens, ECS transactions, 25 (5) (2009), 179.

DOI: 10.1149/1.3202651

Google Scholar

[7] D. Tsvetanova, R. Vos, M. Pohland, K. Vanstreels, G. Vereecke, A. Franquet, T.N. Parac-Vogt, P.W. Mertens and M.M. Heyns, 3rd Workshop on PESM 2010 (https: /imec-events. be/UserFiles/76/File/Presentations/S4/S4_Tsvetanova. pdf).

DOI: 10.1149/1.3202652

Google Scholar

[8] N.A. Weir, J. Arct and M. Farahani, Polym. Degrad. Stabil., 13 (1985), 361.

Google Scholar