Wet Chemical Oxidation of Silicon Surfaces Prior to the Deposition of All-PECVD AlOx/a-SiNx Passivation Stacks for Silicon Solar Cells

Abdelazize Laades; Heike Angermann; Hans Peter Sperlich; Uta Stürzebecher; Carlos Alberto Díaz Álvarez; Mario Bähr; Alexander Lawerenz

doi:10.4028/www.scientific.net/SSP.195.310

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Optimized Wet Processes and PECVD for High-Efficiency Solar Cells
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Surface Charge and Interface State Density on Silicon Substrates after Ozone Based Wet-Chemical Oxidation and Hydrogen-Termination
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Improved Surface Cleaning by In Situ Hydrogen Plasma for Amorphous/Crystalline Silicon Heterojunction Solar Cells
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HomeSolid State PhenomenaSolid State Phenomena Vol. 195Wet Chemical Oxidation of Silicon Surfaces Prior...

Wet Chemical Oxidation of Silicon Surfaces Prior to the Deposition of All-PECVD AlO_x/a-SiN_x Passivation Stacks for Silicon Solar Cells

Abstract:

Aluminum oxide (AlO_x) is currently under intensive investigation for use in surface passivation schemes in solar cells. AlO_x films contain negative charges and therefore generate an accumulation layer on p-type silicon surfaces, which is very favorable for the rear side of p-type silicon solar cells as well as the p⁺-emitter at the front side of n-type silicon solar cells. However, it has been reported that quality of an interfacial silicon sub-oxide layer (SiO_x), which is usually observed during deposition of AlO_x on Silicon, strongly impacts the silicon/AlO_x interface passivation properties [1]. The present work demonstrates that a convenient way to control the interface is to form thin wet chemical oxides of high quality prior to the deposition of AlO_x/a-SiN_x:H stacks by the plasma enhanced chemical vapor deposition (PECVD).

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Periodical:

Solid State Phenomena (Volume 195)

Pages:

310-313

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.195.310

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Online since:

December 2012

Authors:

Abdelazize Laades, Heike Angermann, Hans Peter Sperlich, Uta Stürzebecher, Carlos Alberto Díaz Álvarez, Mario Bähr, Alexander Lawerenz

Keywords:

AlOx, Interface Passivation, PECVD, SPV, Wet-Chemical Treatment

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References

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