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HomeSolid State PhenomenaSolid State Phenomena Vol. 213Diamond-Like Carbon Films Formed by Pulsed...

Diamond-Like Carbon Films Formed by Pulsed Supersonic Plasma Flow Deposition

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Abstract:

A new technique for the formation of diamond-like carbon thin films with high growth rate on silicon wafers and glass surfaces was investigated. A pulsed plasma source based on disk magnetohydrodynamic accelerator was used; methane was a precursor. Scanning electron and atomic-force microscopy, X-ray photoemission spectroscopy techniques and Raman spectroscopy were used for film characterization. We varied the deposition conditions (pulse time, distance to the source, silicon substrate temperature) to optimize diamond-like carbon film properties. Nitrogen treatment allows us to make nitrogen-doped diamond-like carbon films. We used the oxydgen plasmachemical etching of diamond-like carbon films. Thick nanoporous diamond-like carbon films were formed.

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Physics and Technology of Nanostructured Materials II

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Periodical:

Solid State Phenomena (Volume 213)

Pages:

137-142

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.213.137

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Online since:

March 2014

Authors:

Yuri V. Nastaushev, Tatiana A. Gavrilova, Evgenij Vladimirovich Fedosenko, George A. Pozdnyakov*, Fedor N. Dultsev

Keywords:

Diamond-Like Carbon (DLC) Film, Disk Magnetohydrodynamic Accelerator, Thick Nanoporous Film

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

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