Collection Efficiency of Noble Metallic Contaminants on Si Wafers with HF-Aqua Regia Mixtures for VPD-DC ICPMS Analysis

M. Devita; H. Fontaine; N. Drogue; D. Mathiot; V. Enyedi; T. Lardin

doi:10.4028/www.scientific.net/SSP.219.268

Paper Titles

FOUP Material Influence on HF Contamination during Queue-Time
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Effect of FOUP Atmosphere Control on Process Wafer Integrity in Sub20 nm Device Fabrication
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Correlation of Cleaning Conditions and Wafer Out-Gassing
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Quantitative Analysis of Transition Metals Penetrating Silicon Substrate through SiN Film by Dopant Ion Implantation and Annealing
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Collection Efficiency of Noble Metallic Contaminants on Si Wafers with HF-Aqua Regia Mixtures for VPD-DC ICPMS Analysis
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Backside and Bevel Contamination Removal
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Focus Spot Reduction by Brush Scrubber Cleaning
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Upside-Down Residual Sessile Droplet: Watermarks on Wafers Backside
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Nuclear Magnetic Resonance Spectroscopy of Trace Organic Impurities Extracted from a Corrosion Inhibitor and a Semiaqueous Residue Remover
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Collection Efficiency of Noble Metallic Contaminants on Si Wafers with HF-Aqua Regia Mixtures for VPD-DC ICPMS Analysis

Abstract:

of several new materials in clean rooms, the monitoring of trace metallic contamination is a real and present need. It is well known [1][2][3] that these impurities are detrimental to the efficiency of the microelectronics devices: they could cause crystal defects, act as electron traps, degrade minority carrier lifetime or increase the leakage current. Concerning the noble metallic contaminants (Au, Pt, Ir, Ru, Ag and Pd), now used in microelectronics to improve devices performances, their surface contamination control at low level (< 10¹⁰ at.cm^-2) remains a great challenge.

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Periodical:

Solid State Phenomena (Volume 219)

Pages:

268-271

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.219.268

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Online since:

September 2014

Authors:

M. Devita*, H. Fontaine, N. Drogue, D. Mathiot, V. Enyedi, T. Lardin

Keywords:

Ionic Form of Contaminants, Noble Metallic Contamination, Outplated Form of Contaminants, VPD-DC Collection Efficiency, VPD-DC-ICPMS

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