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Non-Visual Defect Monitoring with Surface Voltage Mapping: Application for Semiconductor IC and PV Technology

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Abstract:

Non Visual Defects (NVD) is a category of defects that cause electrical failures but are not detected with visual wafer inspection tools. Our approach for NVD detection is based on the Kelvin probe surface voltage mapping technique. The detection of defects is enhanced using field-effect created in a non-contact manner by corona charge deposition on the surface of semiconductor. Precise defect location is accomplished with surface voltage gradient magnitude mapping that enhances delineation of defects. Detected defects are characterized locally using the corona-voltage technique or isothermal voltage transient decay analysis. Presented examples include: dielectric charge and interfacial defect mapping on 300mm Si wafers; deep level emission mapping on epitaxial SiC and mobile ion mapping in Si solar cells.

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Periodical:

Solid State Phenomena (Volume 242)

Pages:

472-477

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.242.472

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Online since:

October 2015

Authors:

Piotr Edelman*, Dmitriy Marinskiy, Alexandre Savtchouk, John D'Amico, Andrew Findlay, Marshall Wilson, Carlos Almeida, Jacek Lagowski

Keywords:

Contamination, Corona Charge, Gradient Magnitude, Kelvin Probe, Non-Visual Defects, Surface Voltage, Wafer Inspection

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© 2016 Trans Tech Publications Ltd. All Rights Reserved

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* - Corresponding Author

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