Ultra-Trace Sulfate Ion Removal on Photomasks for Haze Reduction

Eric Guo; Crystal Wang; Sandy Qian; Mars Wang; Harry Zhang; Keanu Wu; Jian Shen; Wei Jiang; Fei Xu

doi:10.4028/www.scientific.net/SSP.255.361

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Ultra-Trace Sulfate Ion Removal on Photomasks for Haze Reduction
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HomeSolid State PhenomenaSolid State Phenomena Vol. 255Ultra-Trace Sulfate Ion Removal on Photomasks for...

Ultra-Trace Sulfate Ion Removal on Photomasks for Haze Reduction

Abstract:

Sulfuric Peroxide Mixture (SPM) showed excellent cleaning efficiency for organic contamination as well as metal or metal oxide particles on photomask surface. In order to reduce haze formation during litho process for ArF photomask, it is necessary to remove any ion sources on photomask, such as sulfate ion, ammonium ion, etc. In this paper we reported a new cleaning method, treating photomask with 172nm UV followed by hot DI rinse, reduces residual sulfate ion in MoSiN_xO_y surface and quartz surface by 50% and 80% respectively comparing to traditional cleaning process. We believe that this new process has the potential to greatly alleviate the haze issue caused by sulfate ion and helps increase the lifetime of photomasks

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Periodical:

Solid State Phenomena (Volume 255)

Pages:

361-365

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.255.361

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Online since:

September 2016

Authors:

Eric Guo, Crystal Wang, Sandy Qian, Mars Wang, Harry Zhang, Keanu Wu, Jian Shen, Wei Jiang, Fei Xu*

Keywords:

Haze, Ion Chromatography, MoSiN_xO_y, O₃ Cleaning, Quartz, Residue Sulfate Ion Concentration, Sulfuric Peroxide Mixture (SPM) Cleaning

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* - Corresponding Author

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