Effect of Surfactant in Gas Dissolved Cleaning Solutions on Acoustic Bubble Dynamics

So Young Han; Nagendra Prasad Yerriboina; Bichitra Nanda Sahoo; Bong Kyun Kang; Andreas Klipp; Jin Goo Park

doi:10.4028/www.scientific.net/SSP.314.197

Paper Titles

Breakthrough of Sublimation Drying by Liquid Phase Deposition
p.172

Estimation of the Generation Rate of H· Radicals in a Megasonic Field Using an Electrochemical Technique
p.181

Visualization of Acoustic Waves and Cavitation in Ultrasonic Water Flow
p.186

Simulation of Rayleigh Bubble Growth near a No-Slip Rigid Wall
p.192

Effect of Surfactant in Gas Dissolved Cleaning Solutions on Acoustic Bubble Dynamics
p.197

Interaction between Free-Surface Oscillation and Bubble Translation in a Megasonic Cleaning Bath
p.202

Study on Uniform Deposition on 300 mm Silicon Wafer with Sub-100 nm Sized Particles for Cleaning Application
p.209

Ultrafine Particle Removal in the Wafer Cleaning Process Using an Aqueous Solution with a High Concentration of Dissolved O₃ and HF
p.214

Particle Removal in Ultrasonic Water Flow Cleaning Role of Cavitation Bubbles as Cleaning Agents
p.218

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Effect of Surfactant in Gas Dissolved Cleaning Solutions on Acoustic Bubble Dynamics

Abstract:

Megasonic cleaning is one of the promising technologies to remove the particles during semiconductor processing. Acoustic bubble cavitation plays a key role in removing the particles. In this work, the effect of an anionic surfactant sodium dodecyl sulfate (SDS) on a bubble in the presence of hydrogen dissolved DIW water was studied. The bubble dynamics were observed using a high-speed camera. It was found that with the increase of surfactant the bubble characteristics were changed very significantly. Several parameters affecting the bubble dynamics were investigated.