Real Time AMC Monitoring with Novel Chemical Ionization Mass Spectrometry at Single-Digit pptv Concentrations

Abstract:

In this study, emissions of photoresist resin deposited on wafters in a FOUP are compared using impinger/GCMS at-line measurements and on-line Vocus AMC measurements based on chemical ionization mass spectrometry. While GCMS measurements are routinely used for VOC measurements, the Vocus AMC monitor allows simultaneous, real-time detection of acids, bases, and condensable organics, providing unique insights into the cleanroom and FOUP microenvironment Photoresist resin outgassing measurements show comparable absolute concentrations between the two methods (GCMS and CI-TOF) for targeted compounds in real world sampling scenarios. The rate of outgassing was tracked in real time with the Vocus and also allowed identification of unknown compounds emitted from the resin. Continuous monitoring of the cleanroom air around the FOUP highlights the importance of the cleanroom environment which can directly affect the FOUP microenvironment, and additionally we show that Entegris Barrier Material EBM can guarantee a good wafer protection.

• Periodical: Solid State Phenomena (Volume 346)
• Pages: 176-182
• DOI: https://doi.org/10.4028/p-NK8tbD
• Online since: August 2023
• Authors: P. González-Aguirre, Alissa Wild, Léonie Degaches, Erwan Amade, Carla Frege*, Felipe Lopez-Hilfiker
• Keywords: Airborne Molecular Contamination (AMC), Background, Cleanroom, FOUPs, Online Measurements

References

[1] J. Jeong, J. Park, E. Han, J. Kim, H. Kim. Control of wafer Slot-Dependent Outgassing during Semiconductor Manufacture Process. 2019 30th.

DOI: 10.1109/ASMC.2019.8791794

[2] P. González-Aguirre, H. Fontaine, C. Beitia, J. Ohlsen, J. Lundgren, Control of HF volatile contamination in FOUP environment by advanced polymers and clean gas purge. 219 (2015), 247-250.

DOI: 10.4028/www.scientific.net/ssp.219.247

[3] J. Krechner, F. Lopez-Hilfiker, A. Koss, M. Hutterli, C. Stoermer, B. Deming, J. Kimmel, C. Warneke, R. Holzinger, J. Jayne, D. Worsnop, K. Fuhrer, M. Gonin and J. de Gouw, Evaluation of a New Reagent-Ion Source and Focusing Ion−Molecule Reactor for Use in Proton-Transfer-Reaction Mass Spectrometry. 2018, 90, 20, 12011–12018.

DOI: 10.1021/acs.analchem.8b02641

[4] F. Lopez-Hilfiker, S. Iyer, C.Mohr, B.H. Lee, E.L. D'Ambro, T. Kurtén and J.A. Thornton, Constraining the sensitivity of iodide adduct chemical ionization mass spectrometry to multifunctional organic molecules using the collision limit and thermodynamic stability of iodide ion adducts., 9, 1505–1512, 2016.

DOI: 10.5194/amt-9-1505-2016

[5] H. Katajima, Y. Shiremizu, Requirement for contamination control in the gigabit era. 10 (1997) 267-272.

[6] J.G. Wijmans, R.W. Baker. The solution-diffusion model: a review. 107 (1995), 1-21.

[7] P. González-Aguirre, H. Fontaine, S.I. Moon, C. Beitia, J. Lundgren, J. Ohlsen, FOUP decontamination solutions to control AMCs in semiconductor fabs: Gas purge or wet cleaning? 194 (2018), 19-24.

DOI: 10.1016/j.mee.2018.03.002

[8] M. Claes, S. De Gendt, C. Kenens, T. Conard, H. Bender, W. Storm, T. Bauer, P. Mertens, M.M. Heyns, Controlled deposition of organic contamination and removal with ozone-based cleanings. 148 (2001) G118–G125.

DOI: 10.1149/1.1346618

[9] S. Tlili, E. Gomez Alvarez, S. Gligorovski, H. Wortham. Adsorption behavior of two airborne contaminants on wafer surfaces. 187 (2012) 239-247.

DOI: 10.1016/j.cej.2012.01.067

[10] P. González-Aguirre, F. Herrán, S.I. Moon, M-P. Tran, J. Lundgren, C. Beitia, H. Fontaine, Ammonia sorption outgassing and cross contamination ability of Entegris FOUPs evaluation and its volatile acids comparison. 205 (2019), 53-58.

DOI: 10.1016/j.mee.2018.11.012