Paper Titles

Evidence for Defect Metastability in Hydrogen Passivated Fine Grain Polycrystalline Silicon
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Deuterium Effusion from Microcrystalline Sputtered Silicon Thin Films: Hydrogen Stability and Bonding Configurations
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Defect Structure of Multicrystalline Chemical Vapor Deposited Silicon Films
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Optical and Photoelectrical Properties of Microcrystalline Silicon Layers in Relation to Structural Ordering
p.387

Photo-Induced and Thermally Stimulated Degredation in a-Si:H : Mechanism of Defect Creation
p.393

Electrical Properties and Microstructure of Metal Oxides Varistors
p.399

General and Characteristic Features of the Structure of Polycrystalline and Non-Crystalline Silicon
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Properties of Anodically Oxidized Polycrystalline Silicon Layers
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Properties of Multicrystalline Silicon Heat Treated by Classical and Rapid Thermal Processing
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HomeSolid State PhenomenaSolid State Phenomena Vols. 37-38Photo-Induced and Thermally Stimulated Degredation...

Photo-Induced and Thermally Stimulated Degredation in a-Si:H : Mechanism of Defect Creation

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Polycrystalline Semiconductors III

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Periodical:

Solid State Phenomena (Volumes 37-38)

Pages:

393-398

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.37-38.393

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Online since:

March 1994

Authors:

S.B. Aldabergenova, Boris A. Andreev, K.V. Koughia, T.A. Sidorova

Keywords:

Amourphous Hydrogenated Silicon, Defect Creation, Metastable Defect, Microstructure, Photo-Degradation

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© 1994 Trans Tech Publications Ltd. All Rights Reserved

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