Comparison and Sustainability Enhancement of Oxide Coatings by Reactive and Non-Reactive Radio Frequency Magnetron Sputtering Technique

Abstract:

Technological advancements and changing global needs drive deposition techniques, widely used for altering surface properties of components. The crosswinds from global technological advancements in the mobility and power sectors have piqued the interest in sustainable renewable energy tapping devices. Thin aluminium oxide (Al2O3) films are highly valued for various applications in the manufacturing industry, such as cutting tool coatings, optics, energy, and microelectronics. A novel and facile approach has been adopted in the present work to fabricate an oxide-based thin film on a BK7 glass substrate. The aluminium oxide film is deposited by reactive radio frequency (RF) magnetron sputtering by impinging adequate argon to oxygen ratio in a high vacuum environment. Furthermore, Al2O3 is deposited by an alumina target with the same deposition technique, and the results were compared. A digital thickness monitor (DTM) is used to assess the thickness of the deposited film for both processes. The films were first characterized by X-ray diffraction and then analysed by other characterization methods, including Scanning Electron Microscopy, Atomic Force Microscopy, Tribometer and Nanoindentation, and UV-visible spectroscopy. The results indicated that Al2O3 deposited by reactive RF magnetron sputtering performed better in terms of surface morphology, UV-absorbance, nanohardness, and wear resistance and is therefore, more reliable and sustainable when compared with non-reactive RF magnetron sputtering.

• Periodical: Solid State Phenomena (Volume 370)
• Pages: 73-79
• DOI: https://doi.org/10.4028/p-NKjU7d
• Online since: March 2025
• Authors: Rishabh Raj Srivastava*, Sudarsan Ghosh, Paruchuri Venkateswara Rao
• Keywords: Al₂O₃ Coatings, Optoelectronics, Reactive Sputtering, Tribology

References

[1] Shi-Gang, X., Li-Xin, S., Rong-Gen, Z. and Xing-Fang, H., 2005. Properties of aluminium oxide coating on aluminium alloy produced by micro-arc oxidation. Surface and Coatings Technology, 199(2-3), pp.184-188.

DOI: 10.1016/j.surfcoat.2004.11.044

[2] Yin, C., Zhu, M., Zeng, T., Sun, J., Zhang, R., Zhao, J., Wang, L. and Shao, J., 2021. Al 2 O 3 anti-reflection coatings with graded-refractive index profile for laser applications. Optical Materials Express, 11(3), pp.875-883.

DOI: 10.1364/ome.418174

[3] Reddy, I.N., Reddy, V.R., Sridhara, N., Rao, V.S., Bhattacharya, M., Bandyopadhyay, P., Basavaraja, S., Mukhopadhyay, A.K., Sharma, A.K. and Dey, A., 2014. Pulsed rf magnetron sputtered alumina thin films. Ceramics International, 40(7), pp.9571-9582.

DOI: 10.1016/j.ceramint.2014.02.032

[4] Oke, J.A. and Jen, T.C., 2022. Atomic layer deposition and other thin film deposition techniques: from principles to film properties. Journal of Materials Research and Technology, 21, pp.2481-2514.

DOI: 10.1016/j.jmrt.2022.10.064

[5] Kelly, P.J. and Arnell, R.D., 2000. Magnetron sputtering: a review of recent developments and applications. Vacuum, 56(3), pp.159-172.

DOI: 10.1016/s0042-207x(99)00189-x

[6] NOIKAEW, Busarin, Laksana WANGMOOKLANG, Saisamorn NIYOMSOAN, and Siriporn LARPKIATTAWORN. "Preparation of transparent alumina thin films deposited by RF magnetron sputtering." Journal of Metals, Materials and Minerals 31, no. 2 (2021): 96-103.

DOI: 10.55713/jmmm.v31i2.1066

[7] Cremer, R., Reichert, K., Neuschütz, D., Erkens, G. and Leyendecker, T., 2003. Sputter deposition of crystalline alumina coatings. Surface and Coatings Technology, 163, pp.157-163.

DOI: 10.1016/s0257-8972(02)00480-2

[8] Shamala, K.S., Murthy, L.C.S. and Rao, K.N., 2004. Studies on optical and dielectric properties of Al2O3 thin films prepared by electron beam evaporation and spray pyrolysis method. Materials Science and Engineering: B, 106(3), pp.269-274.

DOI: 10.1016/j.mseb.2003.09.036

[9] Zahid, M.A., Khokhar, M.Q., Park, S., Hussain, S.Q., Kim, Y. and Yi, J., 2022. Influence of Al2O3 /IZO double-layer antireflective coating on the front side of rear emitter silicon heterojunction solar cell. Vacuum, 200, p.110967.

DOI: 10.1016/j.vacuum.2022.110967

[10] Lin, Jianliang. "High rate reactive sputtering of Al2O3 coatings by HiPIMS." Surface and Coatings Technology 357 (2019): 402-411.

DOI: 10.1016/j.surfcoat.2018.10.024

[11] Ferreira, Marta P., D. Martínez-Martínez, J-B. Chemin, and P. Choquet. "Tuning the characteristics of Al2O3 thin films using different pulse configurations: Mid-frequency, high-power impulse magnetron sputtering, and their combination." Surface and Coatings Technology 466 (2023): 129648.

DOI: 10.1016/j.surfcoat.2023.129648

[12] Barroso, G., Li, Q., Bordia, R.K. and Motz, G., 2019. Polymeric and ceramic silicon-based coatings–a review. Journal of materials chemistry A, 7(5), pp.1936-1963.

DOI: 10.1039/c8ta09054h

[13] Khan, S.B., Wu, H. and Zhang, Z., 2018. Omnidirectional SiO2 AR coatings. Coatings, 8(6), p.210.

DOI: 10.3390/coatings8060210

[14] Williamson, E.H., Gee, M., Robertson, D., Watts, J.F., Whiting, M.J. and Yeomans, J.A., 2022. A comparative study of the wear performance of hard coatings for nuclear applications. Wear, 488, p.204124.

DOI: 10.1016/j.wear.2021.204124

[15] P. Aldebert and J.P. Traverse. Neutron diffraction study of structural characteristics and ionic mobiliy of alpha- Al2O3 at high temperatures. Journal of the American Ceramic Society, 65:460–464, 1982.

DOI: 10.1111/j.1151-2916.1982.tb10515.x

[16] Cheng, Y., Chu, C. and Zhou, P., 2020. Low-temperature deposition and hardness enhancement of α-(Al, Cr) 2O3 films by reactive high power pulsed magnetron sputtering. Materials Research Express, 7(11), p.116407.

DOI: 10.1088/2053-1591/abc7e1