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HomeSolid State PhenomenaSolid State Phenomena Vol. 380Growth, Structural and Morphological Properties of...

Growth, Structural and Morphological Properties of Ni₈₀Fe₂₀/ Si (111) Thin Films

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Abstract:

Ni₈₀Fe₂₀ thin films have been manufactured onto monocrystalline silicon substrates, utilizing a physical vapor evaporation technique under vacuum. The thickness of these Permalloy films fluctuates between 16 and 45 nm. The structure and morphology of the Permalloy film are studied as a function of the thickness of the deposited magnetic layer. Rutherford’s backscattering spectroscopy technique was used to quantify the samples. X-ray diffraction method has been used to examine the structure, and the atomic force microscope scrutinizes the surface topography and performs the film roughness. These techniques allowed to infer that all the films crystallize in the face-centered cubic structure and exhibit <111> preferred orientation. The size of the crystallites is directly proportional to the thickness of the magnetic layer. The films are under stress and the lattice parameter increases with thickness. The 45 nm thickest film exhibits the roughest topographic surface with root mean square roughness near 2.4 nm, while the 16 nm thinnest film exhibits the smoothest topographic surface, not exceeding 3 Å. These results, and others, will certainly contribute to a better understanding of the physical properties of Permalloy material, and improve their technological applications

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Periodical:

Solid State Phenomena (Volume 380)

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23-34

DOI:

https://doi.org/10.4028/p-8dLJ4e

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Online since:

November 2025

Authors:

Ahmed Kharmouche*, Lamine Taberkani

Keywords:

AFM, Py, RBS, Thin Films, XRD

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© 2025 Trans Tech Publications Ltd. All Rights Reserved

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