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HomeSolid State PhenomenaSolid State Phenomena Vols. 80-81Influence of Thermal Treatments on the...

Influence of Thermal Treatments on the Crystallisation of LPCVD-Deposited Si Thin Films

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Polycrystalline Semiconductors VI

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Periodical:

Solid State Phenomena (Volumes 80-81)

Pages:

199-204

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.80-81.199

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Online since:

November 2001

Authors:

A. Bachrouri, A. Romano-Rodríguez, J.L. Alay, A. Vilà, J.R. Morante, H. Kotb, R. Rogel, Youri Helen, T. Mohammed-Brahim, M. Sarret, O. Bonnaud

Keywords:

Characterization, Excimer Laser, Polycrystalline Silicon, Rapid Thermal Processing

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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