Influence of Thermal Treatments on the Crystallisation of LPCVD-Deposited Si Thin Films

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Periodical:

Solid State Phenomena (Volumes 80-81)

Edited by:

O. Bonnaud, T. Mohammed-Brahim, H.P. Strunk and J.H. Werner

Pages:

199-204

DOI:

10.4028/www.scientific.net/SSP.80-81.199

Citation:

A. Bachrouri et al., "Influence of Thermal Treatments on the Crystallisation of LPCVD-Deposited Si Thin Films", Solid State Phenomena, Vols. 80-81, pp. 199-204, 2001

Online since:

November 2001

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