Low-Temperature Plasma-Processed Microcrystalline Silicon Thin Films for Large-Area Electronics

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Periodical:

Solid State Phenomena (Volumes 80-81)

Edited by:

O. Bonnaud, T. Mohammed-Brahim, H.P. Strunk and J.H. Werner

Pages:

361-366

DOI:

10.4028/www.scientific.net/SSP.80-81.361

Citation:

P. Roca i Cabarrocas et al., "Low-Temperature Plasma-Processed Microcrystalline Silicon Thin Films for Large-Area Electronics", Solid State Phenomena, Vols. 80-81, pp. 361-366, 2001

Online since:

November 2001

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Price:

$35.00

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