The Influence of the Use of Different Catalyzers in Hot-Wire CVD for the Deposition of Polycrystalline Silicon Thin Films

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Periodical:

Solid State Phenomena (Volumes 80-81)

Edited by:

O. Bonnaud, T. Mohammed-Brahim, H.P. Strunk and J.H. Werner

Pages:

53-58

DOI:

10.4028/www.scientific.net/SSP.80-81.53

Citation:

P.A.T.T. van Veenendaal et al., "The Influence of the Use of Different Catalyzers in Hot-Wire CVD for the Deposition of Polycrystalline Silicon Thin Films", Solid State Phenomena, Vols. 80-81, pp. 53-58, 2001

Online since:

November 2001

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$35.00

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