High Quality Textured C60 Thin Films on a Mica Substrate: Growth, Crystalline Structure, Electrical and Photoelectric Properties
p.15
p.15
Electrical Properties of Grain Boundaries in Titanate Ceramics
p.21
p.21
Local Potential at Atomically Abrupt Oxide Grain Boundaries by Scanning Probe Microscopy
p.33
p.33
Large-Area Polycrystalline p-Type Silicon Films Produced by the Hot Wire Technique
p.47
p.47
The Influence of the Use of Different Catalyzers in Hot-Wire CVD for the Deposition of Polycrystalline Silicon Thin Films
p.53
p.53
Boron-Doped Polysilicon: Growth Kinetics and Structural Study of Low-Pressure Chemical Vapour Deposited Films in the Case of High Doping Levels
p.59
p.59
Quasi-Epitaxial Growth of Silicon Layers by Hydrogen Reactive Magnetron Sputtering at Temperatures as Low as 200 °C
p.65
p.65
Effects of Ion Bombardment upon Microcrystalline Silicon Growth
p.71
p.71
Nucleation and Growth of Hydrogenated Microcrystalline Silicon Films: New Insights from Scanning Probe Microscopies
p.77
p.77
The Influence of the Use of Different Catalyzers in Hot-Wire CVD for the Deposition of Polycrystalline Silicon Thin Films
Abstract:
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Periodical:
Solid State Phenomena (Volumes 80-81)
Pages:
53-58
Citation:
Online since:
November 2001
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Сopyright:
© 2001 Trans Tech Publications Ltd. All Rights Reserved
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