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Online since: March 2008
This edition of the periodical "Materials Science
Forum" contains 30 contributions from authors from nine different countries around the world.
Starting with the silicon wafer material itself and emphasizing various aspects of the device from advanced gate dielectrics through to source/drain engineering, this issue ends with a summary on fully silicided gates.
If not supported and pushed ahead by a few scientists and engineers, the technology would probably have disappeared a few years later again.
Beyond that he supported the community by editing and co-organizing the International RTP conferences as well as the German RTP Users Group Meetings, providing inputs to the German "Arbeitskreis Heizprozesse" within the VDE/VDI - Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik (GMM) and teaching young scientists and engineers at international seminars.
Starting with the silicon wafer material itself and emphasizing various aspects of the device from advanced gate dielectrics through to source/drain engineering, this issue ends with a summary on fully silicided gates.
If not supported and pushed ahead by a few scientists and engineers, the technology would probably have disappeared a few years later again.
Beyond that he supported the community by editing and co-organizing the International RTP conferences as well as the German RTP Users Group Meetings, providing inputs to the German "Arbeitskreis Heizprozesse" within the VDE/VDI - Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik (GMM) and teaching young scientists and engineers at international seminars.
Online since: December 2011
Authors: Zhen Kuai, Yin Li Chen, Bao Tong Zhuang, Yin Hua Jiang, Guo Sen Zhu, Ai Min Zhao
Research on the Effect of Microalloy elements Mo and Nb on CCT Curve of Q&P Steel
Zhen Kuai1 a, Yinli Chen1 b, Baotong Zhuang1, Aimin Zhao1, Yinhua Jiang2, Guosen Zhu2
1Research Institute of Metallurgy Engineering, University of Science and Technology Beijing, Beijing 100083, China
2Shougang Research Institute of Technology, Shougang Group Corporation, Beijing 100041, China
akuaizhen8@163.com, byinli_chen@ustb.edu.cn
Keywords: low-carton microalloy Q&P steel with Nb and Mo; thermo-mechanical simulation; metallographic hardness analysis; CCT curve.
In this case, a fundamentally new heat treatment named quenching and partitioning (Q&P) has been proposed[9,10] to create advanced high strength steels with a controlled amount of carbon-enriched retained austenite at room temperature.
Forum 500-501 (2005) 495
Forum 426–432 (2003) 1089 [11] J.
Conf. on Advanced High Strength Sheet Steels for Automotive Applications, Association for Iron and Steel Technology, Warrendale, PA, 2004, pp. 51-62
In this case, a fundamentally new heat treatment named quenching and partitioning (Q&P) has been proposed[9,10] to create advanced high strength steels with a controlled amount of carbon-enriched retained austenite at room temperature.
Forum 500-501 (2005) 495
Forum 426–432 (2003) 1089 [11] J.
Conf. on Advanced High Strength Sheet Steels for Automotive Applications, Association for Iron and Steel Technology, Warrendale, PA, 2004, pp. 51-62
Online since: November 2016
Authors: Mahesh Chandra Somani, David A. Porter, Antti Kaijalainen, Jaakko I. Hannula, Devesh K. Misra
Porter1
1University of Oulu, Centre for Advanced Steels Research, P.O.
Box 4200, 90014 Oulu, Finland 2University of Texas at El Paso, Dept. of Metallurgical and Materials Engineering, Engineering Building, El Paso, TX 79968-0521, USA Keywords: Direct quenching, hardebility, ideal critical diameter, thermomechanical rolling, finish rolling temperature, quenching and partitioning, martensite, retained austenite, bendability.
A part of this research was carried out under the auspices of Finnish Metals and Engineering Competence Cluster (FIMECC)’s Light and Efficient Solutions Program.
Forum 706-709 (2012) 2824-2829
Forum 762 (2013) 83-88
Box 4200, 90014 Oulu, Finland 2University of Texas at El Paso, Dept. of Metallurgical and Materials Engineering, Engineering Building, El Paso, TX 79968-0521, USA Keywords: Direct quenching, hardebility, ideal critical diameter, thermomechanical rolling, finish rolling temperature, quenching and partitioning, martensite, retained austenite, bendability.
A part of this research was carried out under the auspices of Finnish Metals and Engineering Competence Cluster (FIMECC)’s Light and Efficient Solutions Program.
Forum 706-709 (2012) 2824-2829
Forum 762 (2013) 83-88
Online since: July 2015
Preface
This special issue of Defect and Diffusion Forum contains selected peer-reviewed papers presented
at the tenth International Conference on Diffusion in Solids and Liquids (DSL-2014) held at the Tapis
Rouge Paris, France during the period 233r-27th June, 2014.
Rocha), DIFFUSION PROCESSES AND REACTIONS IN ENGINEERING ALLOYS (SS2) (by H.
Celata ENEA - Division of Advanced Technologies for Energy and Industry, ITALY N.
Rocha), DIFFUSION PROCESSES AND REACTIONS IN ENGINEERING ALLOYS (SS2) (by H.
Celata ENEA - Division of Advanced Technologies for Energy and Industry, ITALY N.
Online since: January 2022
Preface
The 5th International Conference on Materials Sciences and Nanomaterials (ICMSN 2021) and the 4th International Conference on Advanced Composite Materials (ICACM 2021) were held virtually via the ZOOM platform separately.
The ICMSN and ICACM conference series was initiated to promote research results in advanced materials science, mainly focusing on nanomaterials and advanced composite materials.
The conference provided a platform for discussions on real problems in nanomaterials, advanced composite materials, electronic materials, material chemistry, and materials processing technologies, to name a few.
They were selected based on their quality and relevance to the themes of the forums.
Alguno, MSU-Iligan Institute of Technology, Philippines Sarabjeet Singh Sidhu, Beant College of Engineering and Technology, India Rene Roy, Research Center for Aircraft Core Technology and ReCAPT, Gyeongsang National University, South Korea Prof.
The ICMSN and ICACM conference series was initiated to promote research results in advanced materials science, mainly focusing on nanomaterials and advanced composite materials.
The conference provided a platform for discussions on real problems in nanomaterials, advanced composite materials, electronic materials, material chemistry, and materials processing technologies, to name a few.
They were selected based on their quality and relevance to the themes of the forums.
Alguno, MSU-Iligan Institute of Technology, Philippines Sarabjeet Singh Sidhu, Beant College of Engineering and Technology, India Rene Roy, Research Center for Aircraft Core Technology and ReCAPT, Gyeongsang National University, South Korea Prof.
Online since: May 2019
This conference provides a prominent international forum for reporting new developments in the areas of wide bandgap semiconductors (SiC, GaN, AlN, diamond, Ga2O3, ZnO, and etc.) and their device fabrication, including advances in the bulk and epitaxial growth, material structure and property, photoelectron and electronic device.
As many as 20 invited talks and 50 contributed presentations were given, providing a stimulating overview of the latest advances in wide bandgap semiconductors technology.
Liwei Guo (Institute of Physics, CAS, China) Yasuto Hijikata (Saitama University, Japan) Wei Huang (Fudan University, China) Chih-Fang Huang (National Tsing Hua University, Taiwan) Fengyi Jiang (Nanchang University, China) Zhanping Lai (The 46th Research Institut of China Electronic Technology Group Corporation, China) Chwan-Ying Lee (Hestia Power Inc., Taiwan) Kung-Yen Lee (National Taiwan University, Taiwan) Shunfeng Lee (Dongguan Institute of Opto-Electronics Peking University, China) Sooseong Kim (TRinno Technology, Korea) Bingbing Liu (Jilin University, China) Calvin Liu (Globalwafers Co., Ltd., Taiwan) Guoyou Liu (Zhuzhou CRRC Times Electric Co., Ltd., China) Xinyu Liu (Institute of Microelectronics, CAS, China) Xuechao Liu (Shanghai Institute of Ceramics, CAS, China) Guoquan Lu (Virginia Tech., USA) Hideharu Matsuura (Osaka Electro-Communication University, Japan) Tokuyasu Mizuhara (ROHM Semiconductor (Shanghai) Co., Ltd., Japan) Puqi Ning (Institute of Electrical Engineering
, CAS, China) Chulmin Oh (Korea Electronic Technology Institute, Korea) Tonghua Peng (TankeBlueSemiconductor Co., Ltd., China) Yufeng Qiu (Global Energy Internet Institute, China) Mark Ramm (STR Group, Inc., Russia) Bo Shen (Peking University, China) Guosheng Sun (Institute of Semiconductors, CAS, China) Koukou Suu (ULVAC, Inc., Japan) Xuhui Wen (Institute of Electrical Engineering, CAS, China) Ke Xu (Suzhou Institute of Nano-Tech and Nano-Bionics, CAS, China) Kouji Yamaguchi (Fuji Electric Co., LTD., Jpan) Anping Zhang (Xi'an Jiaotong University, China) Q.
As many as 20 invited talks and 50 contributed presentations were given, providing a stimulating overview of the latest advances in wide bandgap semiconductors technology.
Liwei Guo (Institute of Physics, CAS, China) Yasuto Hijikata (Saitama University, Japan) Wei Huang (Fudan University, China) Chih-Fang Huang (National Tsing Hua University, Taiwan) Fengyi Jiang (Nanchang University, China) Zhanping Lai (The 46th Research Institut of China Electronic Technology Group Corporation, China) Chwan-Ying Lee (Hestia Power Inc., Taiwan) Kung-Yen Lee (National Taiwan University, Taiwan) Shunfeng Lee (Dongguan Institute of Opto-Electronics Peking University, China) Sooseong Kim (TRinno Technology, Korea) Bingbing Liu (Jilin University, China) Calvin Liu (Globalwafers Co., Ltd., Taiwan) Guoyou Liu (Zhuzhou CRRC Times Electric Co., Ltd., China) Xinyu Liu (Institute of Microelectronics, CAS, China) Xuechao Liu (Shanghai Institute of Ceramics, CAS, China) Guoquan Lu (Virginia Tech., USA) Hideharu Matsuura (Osaka Electro-Communication University, Japan) Tokuyasu Mizuhara (ROHM Semiconductor (Shanghai) Co., Ltd., Japan) Puqi Ning (Institute of Electrical Engineering
, CAS, China) Chulmin Oh (Korea Electronic Technology Institute, Korea) Tonghua Peng (TankeBlueSemiconductor Co., Ltd., China) Yufeng Qiu (Global Energy Internet Institute, China) Mark Ramm (STR Group, Inc., Russia) Bo Shen (Peking University, China) Guosheng Sun (Institute of Semiconductors, CAS, China) Koukou Suu (ULVAC, Inc., Japan) Xuhui Wen (Institute of Electrical Engineering, CAS, China) Ke Xu (Suzhou Institute of Nano-Tech and Nano-Bionics, CAS, China) Kouji Yamaguchi (Fuji Electric Co., LTD., Jpan) Anping Zhang (Xi'an Jiaotong University, China) Q.
Online since: October 2014
AMSEM2014 is a forum for presentation of new research results on material science,
environmental material and information technology.
The editor hopes that this book will provide readers a broad overview of the latest advances on material science, environmental material and information technology.
The editor also believes this book would be a good reference for academic researchers and industrial professionals in the fields of material science and engineering, environmental material, water pollution, information technology and intelligent systems.
Radhakrishna, R V College of Engineering, Bangalore, India Dr.
The editor hopes that this book will provide readers a broad overview of the latest advances on material science, environmental material and information technology.
The editor also believes this book would be a good reference for academic researchers and industrial professionals in the fields of material science and engineering, environmental material, water pollution, information technology and intelligent systems.
Radhakrishna, R V College of Engineering, Bangalore, India Dr.
Online since: January 2010
Authors: Guo Sheng Gai, Yu Fen Yang, Lian Wei Yang, Peng Sun, Xiao Yan Zhao, Yu Rong Wang
Physicochemical characterization of Qianghuo particles by
ultrafine pulverization
Lianwei Yang a, Xiaoyan Zhao a , Peng Sun a, Guosheng Gai a , Yufen Yang a,
Yurong Wang b
a
Powder Technology R & D, Key Laboratory for Advanced Materials of Ministry of Education,
Department of Material Science and Technology,Tsinghua University,Beijing 100084,PR
China
b
School of Chinese Pharmacy, BUCM, Beijing 100102,PR China
Corresponding author:Dr.
In the present study, an advanced High Speed Centrifugal Sheering (HSCS) pulverizer was used to pulverize Qianghuo to ultrafine particles.
Minerals Engineering, 2008,21,1-4
Traditional Chinese Medicine, 2005,8,1046-1048 [8] Lianwei Yang, Xiaoyan Zhao and Guosheng Gai, The impact of ultrafine pulverization on Chinese traditional medicine. 2008 china international powder technology & application forum, 2008,4, 11-15
[9] Lianwei Yang and Jianxia Fu, Ultrafine pulverization technology and application. 2008 china international powder technology & application forum,4, 16-19(2008)
In the present study, an advanced High Speed Centrifugal Sheering (HSCS) pulverizer was used to pulverize Qianghuo to ultrafine particles.
Minerals Engineering, 2008,21,1-4
Traditional Chinese Medicine, 2005,8,1046-1048 [8] Lianwei Yang, Xiaoyan Zhao and Guosheng Gai, The impact of ultrafine pulverization on Chinese traditional medicine. 2008 china international powder technology & application forum, 2008,4, 11-15
[9] Lianwei Yang and Jianxia Fu, Ultrafine pulverization technology and application. 2008 china international powder technology & application forum,4, 16-19(2008)