Sort by:
Publication Type:
Open access:
Publication Date:
Periodicals:
Search results
Online since: June 2013
Authors: Adam Grajcar, Krzysztof Radwański, Hanna J. Krztoń
Microstructural Analysis of a Thermomechanically Processed
Si-Al TRIP Steel Characterized by EBSD and X-Ray Techniques
GRAJCAR Adam1,a, RADWAŃSKI Krzysztof2,b and KRZTOŃ Hanna2,c
1 Institute of Engineering Materials and Biomaterials, Silesian University of Technology,
18a Konarskiego Street, 44-100 Gliwice, Poland
2 Institute for Ferrous Metallurgy, 12-14 K.
Introduction Advanced high-strength steels (AHSS) characterized by a multiphase microstructure belong to the most spectacular achievements in the field of novel materials for automotive industry.
Forum Vol. 550 (2007), p. 265 [2] A.
Forum Vol. 706-709 (2012), p. 2124 [3] A.
Introduction Advanced high-strength steels (AHSS) characterized by a multiphase microstructure belong to the most spectacular achievements in the field of novel materials for automotive industry.
Forum Vol. 550 (2007), p. 265 [2] A.
Forum Vol. 706-709 (2012), p. 2124 [3] A.
Online since: July 2013
Authors: Pavel Sherstnev, Evgeniya Kabliman
The material strengthening is considered in the present work in terms of solid solution strengthening (the Labusch-Naborro model), work hardening (the advanced one-parameter Kocks model), as well as precipitation strengthening due to the stress contribution of non-deformable particles, i.e. dispersoids (the Orowan by-pass).
European Congress on Computational Methods in Applied Sciences and Engineering (ECCOMAS 2012), Vienna, Austria (2012) [4] E.
Thijsse, Atomistic Simulation of Pipe Diffusion in AlCu alloys, Defect and Diffusion Forum 249 (2006) 47-54
European Congress on Computational Methods in Applied Sciences and Engineering (ECCOMAS 2012), Vienna, Austria (2012) [4] E.
Thijsse, Atomistic Simulation of Pipe Diffusion in AlCu alloys, Defect and Diffusion Forum 249 (2006) 47-54
Online since: March 2007
Authors: Bernard Pieraggi, Philippe Lours, Yu Hong Qi, Yannick Le Maoult
Though very attractive, the interfacial
indentation technique requires both high thickness oxide scale and undamaged scales upon return to
room temperature which is not the most common case encountered for engineering alloys.
Clarke et al, Materials Science Forum, 461-464 (2004) 621-630 [3] A.
Galerie et al, Materials Science Forum, 461-464 (2004) 631-638 [4] P.
Lours et al, Materials Science Forum, 461-464 (2004) 639-646 [5] D.
Baleix et al, Materials Science & Engineering.
Clarke et al, Materials Science Forum, 461-464 (2004) 621-630 [3] A.
Galerie et al, Materials Science Forum, 461-464 (2004) 631-638 [4] P.
Lours et al, Materials Science Forum, 461-464 (2004) 639-646 [5] D.
Baleix et al, Materials Science & Engineering.
Online since: May 2005
Authors: Stephen E. Saddow, Daniel Turover, Mark E. Twigg, Hugues Mank, Catherine Moisson
Saddow
3,e
1
NOVASiC, Savoie Technolac - Arche Bât.4, BP 267, F-73375 Le Bourget du lac Cedex, France
2
Naval Research Laboratory, Code 6813, Washington, DC 20375, USA
3
Electrical Engineering Dept., University of South Florida, Tampa, Florida 33620, USA
a
hmank@novasic.com, bcmoisson@novasic.com, cdturover@novasic.com,
d
twigg@estd.nrl.navy.mil, esaddow@nnrc.usf.edu
Keywords : 3C-SiC, epilayer, (001)Si, Chemical-Mechanical Polishing (CMP), regrowth
Abstract.
Forum Vol. 457-460 (2004), p.
Vicente : Silicon Carbide Recent Major Advances, Springer, (2004), p. 699-710
Forum Vol. 389-393 (2001), p. 729-732.
Forum Vol. 457-460 (2004), p.
Vicente : Silicon Carbide Recent Major Advances, Springer, (2004), p. 699-710
Forum Vol. 389-393 (2001), p. 729-732.
Online since: June 2015
Authors: Gabriel Ferro, Véronique Soulière, Davy Carole, Kassem Alassaad, Beatrice Doisneau, François Cauwet
Ferro, Advanced Functional Material, 16 (2006) 975-979
Forum 778-780 (2014) 187-192 [7] K.
Madar, Material Science Forum, 457-460 (2004) 387
Monteil, Materials Science and Engineering: B, 130 (2006) 66-72
Forum 778-780 (2014) 187-192 [7] K.
Madar, Material Science Forum, 457-460 (2004) 387
Monteil, Materials Science and Engineering: B, 130 (2006) 66-72
Online since: January 2012
Authors: Takayoshi Nakano, Takuya Ishimoto, Takashi Sakai, Hideki Yoshikawa, Kentaro Kawata
Regeneration of Bone Mass and Bone Quality around Implant with Grooves for Aligning Bone Cells in Rabbit Hindlimb Bones
Takuya Ishimoto1,a, Kentaro Kawata1,b, Takashi Sakai2,c,
Hideki Yoshikawa2,d, and Takayoshi Nakano1,e
1Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University, 2-1, Yamada-oka, Suita, Osaka 565-0871, Japan
2Department of Orthopaedic Surgery, Osaka University Medical School, 2-2, Yamada-oka, Suita, Osaka 565-0871, Japan
aishimoto@mat.eng.osaka-u.ac.jp, bkkawata@himeji.sanyo-steel.co.jp, ctsakai@ort.med.osaka-u.ac.jp, dyhideki@ort.med.osaka-u.ac.jp, enakano@mat.eng.osaka-u.ac.jp
Keywords: Bone regeneration, biological apatite (BAp), apatite orientation, microbeam X-ray diffraction, transmission optical system, grooved implant, orientation and migration of cells
Abstract.
Acknowledgements This work was supported by the Priority Assistance of the Formation of Worldwide Renowned Centers of Research—The Global COE Program (Project: Center of Excellence for Advanced Structural and Functional Materials Design); Grants-in-Aid for Young Scientists (S) and (B) from the Japan Society for the Promotion of Science (JSPS); and Funding Program for Next Generation World-Leading Researchers by the Ministry of Education, Culture, Sports, Science and Technology (MEXT) of Japan.
Forum Vols. 638-642 (2010), p. 576
Forum Vols. 654-656 (2010), p. 2241
Acknowledgements This work was supported by the Priority Assistance of the Formation of Worldwide Renowned Centers of Research—The Global COE Program (Project: Center of Excellence for Advanced Structural and Functional Materials Design); Grants-in-Aid for Young Scientists (S) and (B) from the Japan Society for the Promotion of Science (JSPS); and Funding Program for Next Generation World-Leading Researchers by the Ministry of Education, Culture, Sports, Science and Technology (MEXT) of Japan.
Forum Vols. 638-642 (2010), p. 576
Forum Vols. 654-656 (2010), p. 2241
Online since: February 2011
Authors: Jian Ma, Xu Chen, Hong Gao
Preparation of Composite Conductive Microspheres Used in Anisotropic Conductive Adhesive Films
Jian Maa, Hong Gaob and Xu Chenc
School of Chemical Engineering and Technology, Tianjin University, 300072, China
ajiyexuan3@sina.com, bhgao@tju.edu.cn, cxchen@tju.edu.cn
Keywords: Anisotropic Conductive Adhesive Films(ACF); Polystyrene Sphere; Chemical Plating
Abstract: Polymer-based conductive adhesive materials have become widely used in many electronic packaging interconnect applications.
Forum Vol. 127(2005), p. 29-32
[2] Watanabe I, Fujinawa T, Arifuku M, Fujii M and Gotoh Y In: Proceedings of the 9th IEEE international symposium on advanced packaging materials: processes, properties and interfaces, Atlanta, GA, 2004, p 11 [3] J.
Forum Vol. 10(1995), p. 247-252.
Forum Vol. 127(2005), p. 29-32
[2] Watanabe I, Fujinawa T, Arifuku M, Fujii M and Gotoh Y In: Proceedings of the 9th IEEE international symposium on advanced packaging materials: processes, properties and interfaces, Atlanta, GA, 2004, p 11 [3] J.
Forum Vol. 10(1995), p. 247-252.
Online since: October 2006
Authors: Joao A. Labrincha, F. Raupp-Pereira, M.J. Ribeiro, Ana M. Segadães
Labrincha1d
1Ceramics and Glass Engineering Department, CICECO, University of Aveiro, 3810 -193
Aveiro, Portugal
2UIDM, ESTG, Polytechnique Institute of Viana do Castelo, 4900 Viana do Castelo,
Portugal
afraupp@cv.ua.pt, bribeiro@estg.ipvc.pt,
csegadaes@cv.ua.pt, djal@cv.ua.pt
Keywords: extrusion; industrial wastes; ceramic properties.
Science Forum, Advanced Materials Forum III (2006), p. 1726
Science Forum, Advanced Materials Forum III (2006), p. 1726
Online since: June 2004
Authors: Sadafumi Yoshida, Shinichi Nakashima, Junji Senzaki, Hiroyuki Yaguchi, K. Narita, Yasuto Hijikata
Citation &
Copyright (to be inserted by the publisher )
Characterization of electrical properties in high-dose implanted and
post-implantation-annealed 4H-SiC wafers using infrared reflectance
spectroscopy
K.Narita
1, Y.Hijikata
1, H.Yaguchi
1, S.Yoshida
1,2, J.Senzaki2, and S.Nakashima
2
1 Department of Electrical and Electronic Systems, Faculty of Engineering, Saitama University
255 Shimo-ohkubo, Sakura-ku, Saitama-shi, Saitama 338-8570, Japan
2 Power Electronics Research Center, Nat.
Inst. of Advanced Industrial Science and Technology AIST Tsukuba Central2, 1-1-1 Umezono, Tsukuba-shi, Ibaraki 305-8568, Japan Keywords: 4H-SiC, Ion implantation, Activation anneal, Infrared reflectance spectroscopy, Hall measurements, Carrier concentration, Mobility, Crystalline damage Abstract.
Forum, Vol. 389-393, 859 (2002)
Forum, Vol. 389-393, 621 (2002) [7] H.
Inst. of Advanced Industrial Science and Technology AIST Tsukuba Central2, 1-1-1 Umezono, Tsukuba-shi, Ibaraki 305-8568, Japan Keywords: 4H-SiC, Ion implantation, Activation anneal, Infrared reflectance spectroscopy, Hall measurements, Carrier concentration, Mobility, Crystalline damage Abstract.
Forum, Vol. 389-393, 859 (2002)
Forum, Vol. 389-393, 621 (2002) [7] H.
Online since: September 2007
Authors: Vijay Balakrishna, Marek Skowronski, Michael J. O'Loughlin, Joseph J. Sumakeris, Brett A. Hull
Balakrishna1
1
Cree, Inc. 4600 Silicon Drive, Durham, NC, 27703, USA
2
Carnegie Mellon University, Department of Materials Science and Engineering, 5000 Forbes
Avenue, Pittsburgh, PA 15213, USA
joe_sumakeris@cree.com
Keywords: Shockley stacking faults, Bipolar power devices, Forward voltage drift, Basal plane
dislocations, Threading edge dislocations, Dislocation conversion
Abstract.
These advances allow us to yield Vf stable, multi-kV bipolar SiC power devices.
A very significant recent advance in bipolar SiC device technology is the discovery that the naturally preferred conversion of substrate basal plane dislocations (BPDs) into threading edge dislocations (TEDs) in epilayers can be improved to almost 100% efficiency by selectively etching the substrate prior to epilayer growth [4].
Forum Vol. 353-356 (2001), p.299. 2.
Forum Vol. 483-485 (2005), p. 965. 6.
These advances allow us to yield Vf stable, multi-kV bipolar SiC power devices.
A very significant recent advance in bipolar SiC device technology is the discovery that the naturally preferred conversion of substrate basal plane dislocations (BPDs) into threading edge dislocations (TEDs) in epilayers can be improved to almost 100% efficiency by selectively etching the substrate prior to epilayer growth [4].
Forum Vol. 353-356 (2001), p.299. 2.
Forum Vol. 483-485 (2005), p. 965. 6.