Books by Keyword: Atomic Force Microscope (AFM)

Description: Volume is indexed by Thomson Reuters CPCI-S (WoS).
This work presents its readers with the most recent advances in the fields of machining and advanced manufacturing technology. It will be of especial valuable to production and research engineers, research students and academics.

Description: Volume is indexed by Thomson Reuters CPCI-S (WoS).
The main topics covered by this fascinating book, "Materials in Transition", are the manifold aspects of transient phenomena in condensed matter, the kinetics of phase transitions, catalysis, solid-state reactions, self-organization, etc.

Description: The requirements of high precision and of high-quality components and devices in meeting the needs of modern industry and society in disciplines such as semiconductors, optics, nanotechnology, MEMS, manufacturing, biomedical and environmental engineering, make measurement technology and intelligent instruments (which sense, measure and report), more important than ever, and essential for the rapid development of information technology. Following the lead of the previous five publications (1989, 1993, 1996, 1998, 2001) in the series, “Measurement Technology and Intelligent Instruments”, this book presents the most recent advances in this important field. In all, 123 papers were contributed from many regions of the world; including China, Taiwan (China), Japan, Russia, Hong Kong (China), Germany, Australia, Austria, Canada, Korea, Poland, Slovakia and the UK and US.

Description: Volume is indexed by Thomson Reuters CPCI-S (WoS).
Research and development in the field of nanomaterials - thin films, nanowires, nanocrystals and nanostructured bulk materials - has increased very rapidly during recent years. Especially significant has been research in which the structure is closely controlled at the nanometer level in order to achieve the desired functional properties.
Important discoveries have been made, including quantum dots, confinement effects and super-emission, and the prospects for rapid development in these areas are very promising. The results of much of the basic research have been the basis of an astonishing rate of progress in microelectronics. It is therefore expected that the study and development of nanomaterials will provide a firm foundation for a major increase in the number of advanced technologies and for the development of new optoelectronics and photonic devices.

Description: Volume is indexed by Thomson Reuters CPCI-S (WoS).
This volume comprises the proceedings of the 6th international conference on Self-Formation Theory and Applications.

Description: This 3rd Conference on Materials Science, Testing and Informatics provided an invaluable forum for discussions on Functional Materials and Technologies for the New Millennium.
Volume is indexed by Thomson Reuters CPCI-S (WoS).

Description: Recent advances in solid-state chemistry have resulted in substantial progress towards achieving a better understanding of the solid state, and have even led to the development of new predictive capabilities in crystal chemistry. Entirely new ways of studying and preparing advanced materials have been the result of pursuing the so-called "soft chemistry" approach to materials science.

Description: Volume is indexed by Thomson Reuters CPCI-S (WoS).
This book reviews recent developments in the field of shape memory materials, which are becoming more and more important as 'smart (intelligent)' materials. The fundamental principles and properties are discussed, as well as the associated experimental and processing methods. Special emphasis is placed on the present, and potential future, applications of SMMs.
Superelastic wires are already being used for the antennae of cellular phones, and medical stents and guide wires promise to become big business as well. Rapid progress is also being made in fundamental aspects, such as the kinetics of martensitic transformations, premartensitic behavior, aging problems, thin-film SMA, etc. Moreover, new experimental techniques are becoming available: such as imaging plane, TEM with energy filter, AFM, grazing-angle x-ray reflection, etc.

Description: The 5th International Workshop on Beam Injection Assessment of Defects in Semiconductors (BIADS 98) focussed on many theoretical and experimental aspects of this topic. The aim was to bring together specialists working in the fields of both fundamental research and applications. There were more than 80 participants from 15 countries all over the world.

Description: The proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98) cover all aspects of ultra-clean Si-technology: cleaning, contamination control, Si-surface chemistry and topography, and its relationship to device performance and process yield. New areas of concern include: cleaning at the interconnect level, resist strip and polymer removal (dry and wet), cleaning and contamination aspects of metallization, wafer backside cleaning and cleaning after Chemical-Mechanical-Polishing (CMP).