Books by Keyword: Etching

Description: The presented book includes articles on research results in the area of semiconductors based on silicon carbide, gallium nitride and related materials that are widely used today for the production of power solid-state electronic devices. The recent technologies of crystal growth and wafer production and processing techniques, properties of completed semiconductor solid-state structures and devices circuitry, including their applications in sensors, mechatronics, and quantum systems, are explored and analysed in this edition. The book will be valuable to engineers and researchers whose activity is related to the development and production of solid-state electronics. The collected here articles were presented at the 20th International Conference on Silicon Carbide and Related Materials (ICSCRM 2023, 17-22 September 2023, Sorrento, Italy).

Description: The presented volume of the "Journal of Nano Research" includes peer-reviewed articles reflecting the latest research results in the synthesis and properties analysis of nanomaterials and nanoparticles for various engineering applications - starting from synthesis of bionanolubricants, sensor thin films for detection of azo dye, silicon nanowires for photocatalytic applications, perovskite nanorods, proton exchange membranes for fuel cells, and ending with investigation of thermal buckling behaviour of functionally graded nanobeam and application of gold and silver nanoparticles in laser cleaning of archaeology glass. The presented articles collection will be helpful to specialists from many branches of engineering whose activity is related to nanomaterials and nanotechnologies.

Description: This volume contains articles that focus on recent advancements in several fields including the chemical synthesis of fluoroacrylate palm oil polyurethane, the production of silicon nanoparticles from beach sand, analysis of resin-based water pipeline cathodic protection's impact on cancerogenesis, and various biotechnologies used in agriculture and food production. These articles are targeted towards professionals who work in the fields of biotechnologies, nanosynthesis and chemical production.

Description: This proceedings volume contains the proceedings of all presentations of the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) 2023. The subject matter of the UCPSS symposium is ultra-clean processing, isotropic selective etching and surface preparation technology in all steps of the fabrication of micro-and nano-electronic integrated circuits. This volume describes the recent progress in the field of ultra clean surfaces, surface cleaning and preparation for the production of micro- and nano-electronic integrated circuits and related subjects. This involves a wide variety of surfaces of mixed composition and with nano-topography. The goal of the processes is to obtain nano precise etching and cleaning resulting in ultra clean surfaces with a very high degree of perfection, i.e. with minimal amounts of residues or defects. This comprises different surface and cleaning steps throughout the entire device manufacturing process.

Description: This book consists of the selected articles by authors who participated in the 2nd International Conference on Semiconductor Materials and Technology (ICoSeMT 2021, 8-9 November 2021, Malaysia), which ensured that all manuscripts underwent a peer review process. This conference edition aimed to provide insight into the recent advancement and development in the area of optical and electronic materials, optoelectronics and electronics devices, organic and polymeric materials, and packaging technology. The structural, optical, chemical, electrical, and sensing characteristics of various types of semiconductor materials in the form of thin films and nanostructures have been reported in this book. Simulation and experimental studies regarding metal-oxide-semiconductor-based devices, high electron mobility transistors, and other devices are also presented.

Description: The International Conference on Silicon Carbide and Related Materials (ICSCRM) is the most important technical conference series on silicon carbide (SiC) and related materials. Started in Washington, D.C. in 1987, the conference series developed into a bi-annual global forum on SiC from its crystal growth to the reliability in application. After five conferences in the U.S., ICSCRM has been held every two years, alternating between USA, Europe, and Japan. The last three Conferences were held in Giardini Naxos, Italy (2015), Washington, D.C. , USA (2017), and Kyoto, Japan (2019). Due to the pandemic situation in 2020 and 2021, the alternating European edition, the 13th ECSCRM, has been held in 2021, and the 19th ICSCRM has been postponed to 2022. The 19th edition of ICSCRM will be the last of its kind – starting in 2023, the conference series will be united with the European edition. It will form an annual event under the well-established name ICSCRM and a new rotation schedule integrating the SiC communities worldwide.

Description: The special edition includes articles that represented the latest research results and engineering solutions in the area of silicon carbide wafer manufacturing for power electronics, functional polymer and composite materials for various applications and special microwave absorption materials for defence from electromagnetic radiation. This special edition will be interesting to semiconductor power device production specialists and many branches of applied materials science.

Description: The special edition includes articles that represented the latest research results and engineering solutions in the area of electronic device design and production. This special edition will be interesting to specialists in semiconductor power device production, microelectronics and optoelectronics.

Description: This book was created from invited lectures and conference contributions of the "Metallography & Fractography 2022" conference, which is featured as an essential event for the presentation of results achieved in materials science and engineering. The conference participants come from universities, academic research institutions and different branches of industry with an interest in materials science and engineering. The conference also has strong support from companies that are experts in unique experimental equipment. The conference's ambition is regularly to expand the program to cover new approaches, new advanced materials and technologies, new findings in fundamental research and practical production, and to intensify international contacts.

Description: This proceedings volume describes the recent progress in the field of ultra-clean surfaces and surface cleaning and preparation for the production of micro- and nanoelectronic integrated circuits and related subjects. This involves a wide variety of surfaces of mixed composition and with nano-topography with an aspect ratio of lateral dimension/vertical dimension on the order of 1/10. The goal of the processes is to obtain nano precise etching and cleaning, resulting in ultra-clean surfaces with very few residues or defects. This comprises different surface and cleaning steps throughout the entire device manufacturing process.