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Silicon Carbide, III-Nitrides and Related Materials
Description:
Volume is indexed by Thomson Reuters CPCI-S (WoS).
This two-volume set documents the present understanding of many topics of interest, such as the growth of bulk crystals, the growth of epitaxial layers, theoretical modelling, the characterization of as-grown material, the development of suitable processes and of electronic devices which can operate under extreme conditions and exhibit outstanding properties.
This two-volume set documents the present understanding of many topics of interest, such as the growth of bulk crystals, the growth of epitaxial layers, theoretical modelling, the characterization of as-grown material, the development of suitable processes and of electronic devices which can operate under extreme conditions and exhibit outstanding properties.
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Info:
eBook:
ToC:
Editors:
G. Pensl, H. Morkoç, B. Monemar and E. Janzén
THEMA:
TGM
BISAC:
TEC021000
Keywords:
Annealing, Atomic Force Microscope (AFM), Chemical Vapor Deposition (CVD), Defect, Dislocation, Epitaxy, Gallium Nitride (GaN), Interface States (or Traps), Ion Implantation, MBE, MESFET, Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET), Micropipe, Ohmic Contact, Photoluminescence (PL), Polytype, Raman Scattering, Silicon Carbide (SiC), TEM, X-Ray Diffraction (XRD)
Details:
Proceedings of the 7th International Conference on Silicon Carbide, III-Nitrides and Related Materials (ICSCIII-N 97), Stockholm, Sweden, September 1997
Pages:
1606
Year:
1998
ISBN-13:
9780878497904
ISBN-13 (CD):
9783038598411
ISBN-13 (eBook):
9783035705256
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