Silicon Carbide and Related Materials 2006
Materials Science Forum Volumes 556 - 557
doi:10.4028/www.scientific.net/MSF.556-557
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p73
CVD of 6H-SiC on Non-Basal Quasi Polar Faces
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1 M
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Authors: Y. Shishkin, Shailaja P. Rao, Olof Kordina, I. Agafonov, Andrei A. Maltsev, Jawad Hassan, Anne Henry, Catherine Moisson, Stephen E. Saddow
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p77
Developing an Effective and Robust Process for Manufacturing Bipolar SiC Power Devices
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136 K
]
Authors: Joseph J. Sumakeris, Brett A. Hull, Michael J. O'Loughlin, Marek Skowronski, Vijay Balakrishna
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p81
Development of High Growth Rate SiC Epi-Reactor with Controlled Thermal Gradient
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348 K
]
Authors: Masahiko Ito, Hidekazu Tsuchida, Isaho Kamata, L. Storasta
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p85
Effect of Additional Silane on In Situ H2 Etching prior to 4H-SiC Homoepitaxial Growth
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859 K
]
Authors: Kazutoshi Kojima, Satoshi Kuroda, Hajime Okumura, Kazuo Arai
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p89
Epitaxial Growth of 4H-SiC on (000-1) C-Face Substrates by Cold-Wall and Hot-Wall Chemical Vapor Deposition
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1 M
]
Authors: René A. Stein, Bernd Thomas, Christian Hecht
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p93
Film Morphology and Process Conditions in Epitaxial Silicon Carbide Growth via Chlorides Route
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304 K
]
Authors: Maurizio Masi, Alessandro Veneroni, A. Fiorucci, Francesco La Via, Gaetano Foti, Marco Mauceri, Stefano Leone, Giuseppe Pistone, Giuseppe Condorelli, Giuseppe Abbondanza, Gian Luca Valente, Danilo Crippa
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p97
Growth and Photoluminescence Study of Aluminium Doped SiC Epitaxial Layers
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568 K
]
Authors: Henrik Pedersen, Anne Henry, Jawad Hassan, Peder Bergman, Erik Janzén
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p101
High Quality Uniform SiC Epitaxy for Power Device Applications
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223 K
]
Authors: Jie Zhang, Esteban Romano, Janice Mazzola, Swapna G. Sunkari, Carl Hoff, Igor Sankin, Michael S. Mazzola
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p105
High SiC Growth Rate Obtained by Vapour-Liquid-Solid Mechanism
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741 K
]
Authors: N. Boutarek, Didier Chaussende, Roland Madar
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p109
Homoepitaxial Growth of 4H-SiC Multi-Epilayers and its Application to UV Detection
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2 M
]
Authors: Xing Fang Liu, Guo Sheng Sun, Yong Mei Zhao, Jin Ning, J.Y. Li, Lei Wang, Wan Shun Zhao, M.C. Luo, Jin Min Li
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p113
Homoepitaxial Growth of Vanadium-Doped 4H-SiC Using Bis-Trimethylsilylmethane and Verrocene Precursors
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850 K
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Authors: Ho Keun Song, Han Seok Seo, Jeong Hyun Moon, Jeong Hyuk Yim, Jong Ho Lee, Sun Young Kwon, Hoon Joo Na, Hyeong Joon Kim
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p117
Improved Mesa Designs for the Growth of Thin 4H-SiC Homoepitaxial Cantilevers
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2 M
]
Authors: Andrew J. Trunek, Philip G. Neudeck, David J. Spry
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p121
In Situ Mass Spectrometry for Chemical Identification in SiC Epitaxial Deposition
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746 K
]
Authors: Brian H. Ponczak, James D. Oliver, Soon Cho, Gary W. Rubloff
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p125
In Situ Measurement of Nitrogen during Growth of 4H-SiC by CVD
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140 K
]
Authors: Brenda L. VanMil, Kok Keong Lew, Rachael L. Myers-Ward, Ronald T. Holm, D. Kurt Gaskill, Charles R. Eddy Jr.
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p129
Low Trap Concentration and Low Basal-Plane Dislocation Density in 4H-SiC Epilayers Grown at High Growth Rate
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477 K
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Authors: T. Hori, Katsunori Danno, Tsunenobu Kimoto