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Articles by author: Bart Onsia

• A Study of the Influence of Typical Wet Chemical Treatments on the Germanium Wafer Surface
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p27)
• From Piranha to Barracuda: Mechanism of Ozone and Water Vapor Photoresist Strip in a Wet Bench
  Published in: Ultra Clean Processing of Silicon Surfaces V (p227)
• Introduction of High-k Materials into Wet Processing, Analysis and Behavior
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p19)
• On the Application of a Thin Ozone Based Wet Chemical Oxide as an Interface for ALD High-k Deposition
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p19)
• Single Chemistry Cleaning Solution for Advanced Wafer Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces V (p119)
• Single Chemistry Cleaning Solutions for Advanced Wafer Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p27)
• Surface Preparation Techniques for High-k Deposition on Ge Substrates
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p31)
• Vapor Phase Decomposition - Droplet Collection: Can we Improve the Collection Efficiency for Copper Contamination?
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p93)