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Papers by Author: Bart Onsia

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Surface Preparation Techniques for High-k Deposition on Ge Substrates

Authors: Sven Van Elshocht, A. Delabie, B. Brijs, Matty Caymax, Thierry Conard, Bart Onsia, Riikka Puurunen, Olivier Richard, Jan Van Steenbergen, Chao Zhao, Marc Meuris, Marc Heyns

A Study of the Influence of Typical Wet Chemical Treatments on the Germanium Wafer Surface

Authors: Bart Onsia, Thierry Conard, Stefan De Gendt, Marc Heyns, I. Hoflijk, Paul W. Mertens, Marc Meuris, G. Raskin, Sonja Sioncke, I. Teerlinck, Antoon Theuwis, Jan Van Steenbergen, Chris Vinckier

On the Application of a Thin Ozone Based Wet Chemical Oxide as an Interface for ALD High-k Deposition

Authors: Bart Onsia, Matty Caymax, Thierry Conard, Stefan De Gendt, F. De Smedt, A. Delabie, C. Gottschalk, Marc Heyns, M. Green, S. Lin, Paul W. Mertens, W. Tsai, Chris Vinckier

Single Chemistry Cleaning Solutions for Advanced Wafer Cleaning

Authors: Rita Vos, Marcel Lux, Sophia Arnauts, Karine Kenis, M. Maes, Bart Onsia, James Snow, Frank Holsteyns, Guy Vereecke, Paul W. Mertens, Marc Heyns, O. Doll, A. Fester, Bernd O. Kolbesen, T. Hackett, Mark Hoffman

Introduction of High-k Materials into Wet Processing, Analysis and Behavior

Authors: Bart Onsia, David Hellin, Martine Claes, A. Maes, Stefan De Gendt, Marc Heyns

From Piranha to Barracuda: Mechanism of Ozone and Water Vapor Photoresist Strip in a Wet Bench

Authors: T. Riedel, K. Wolke, Stefan De Gendt, Bart Onsia

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Single Chemistry Cleaning Solution for Advanced Wafer Cleaning

Authors: Rita Vos, O. Doll, A. Fester, Bernd O. Kolbesen, Marcel Lux, Karine Kenis, Bart Onsia, S. De Gendt, E. Schellkes, Z. Hatcher, Paul W. Mertens, Marc Heyns

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Vapor Phase Decomposition - Droplet Collection: Can we Improve the Collection Efficiency for Copper Contamination?

Authors: Stefan De Gendt, A. Huber, Bart Onsia, Sophia Arnauts, Karine Kenis, D. Martin Knotter, Paul W. Mertens, Marc Heyns