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Articles by author: Chris Vinckier

• A Force Study in Brush Scrubbing
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p279)
• A Study of the Influence of Typical Wet Chemical Treatments on the Germanium Wafer Surface
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p27)
• Aging Phenomena in the Removal of Nano-Particles from Si Wafers
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p155)
• Can we Increase the Effiency of Organic Contamination Removal by Ozone/DI-Water Processes by Using Additives?
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p215)
• Determination of Photoresist Degradation Products in O₃/DI Processing
  Published in: Ultra Clean Processing of Silicon Surfaces V (p207)
• Effect of Additives on the Removal Efficiency of Photoresist by Ozone/DI-Water Processes: Experimental Study
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p101)
• Investigation of Metallic Contamination Analysis Using Vapor Phase Decomposition – Droplet Collection – Total Reflection X-Ray Fluorescence (VPD-DC-TXRF) for Pt-Group Elements on Silicon Wafers
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p273)
• Materials Compatibility and Organic Build-Up during Ozone-Based Cleaning of Semiconductor Devices
  Published in: Ultra Clean Processing of Silicon Surfaces V (p63)
• On the Application of a Thin Ozone Based Wet Chemical Oxide as an Interface for ALD High-k Deposition
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p19)
• Photoresist Stripping by Ozone/Water Processes: Effect of Additives
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p309)
• Relation between Particle Density and Haze on a Wafer: a New Approach to Measuring Nano-Sized Particles
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p161)
• The Ozone Solubility and its Decay in Aqueous Solutions: Crucial Issues in Ozonated Chemistries for Semiconductor Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces V (p211)
• Ultra-Thin Oxide Growth on Silicon Using Ozonated Solutions
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p81)
• VPD-DC-TXRF for Metallic Contamination Analysis of Ge Wafers
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p213)