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Papers by Author: F. De Smedt

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Photoresist Stripping by Ozone/Water Processes: Effect of Additives

Authors: H. Vankerckhoven, F. De Smedt, K. Vandersmissen, Martine Claes, Stefan De Gendt, Marc Heyns, Chris Vinckier

309

On the Application of a Thin Ozone Based Wet Chemical Oxide as an Interface for ALD High-k Deposition

Authors: Bart Onsia, Matty Caymax, Thierry Conard, Stefan De Gendt, F. De Smedt, A. Delabie, C. Gottschalk, Marc Heyns, M. Green, S. Lin, Paul W. Mertens, W. Tsai, Chris Vinckier

Can we Increase the Effiency of Organic Contamination Removal by Ozone/DI-Water Processes by Using Additives?

Authors: F. De Smedt, H. Vankerckhoven, Stefan De Gendt, Marc Heyns, Chris Vinckier

215

Effect of Additives on the Removal Efficiency of Photoresist by Ozone/DI-Water Processes: Experimental Study

Authors: H. Vankerckhoven, F. De Smedt, Martine Claes, Stefan De Gendt, Marc Heyns, Chris Vinckier

101

Materials Compatibility and Organic Build-Up during Ozone-Based Cleaning of Semiconductor Devices

Authors: F. De Smedt, Stefan De Gendt, Marc Heyns, Chris Vinckier

The Ozone Solubility and its Decay in Aqueous Solutions: Crucial Issues in Ozonated Chemistries for Semiconductor Cleaning

Authors: F. De Smedt, Stefan De Gendt, Marc Heyns, Chris Vinckier

211

Determination of Photoresist Degradation Products in O₃/DI Processing

Authors: H. Vankerckhoven, F. De Smedt, B. Van Herp, Martine Claes, Stefan De Gendt, Marc Heyns, Chris Vinckier

207

Surface Characterization after Different Wet Chemical Cleans

Authors: Martine Claes, Erika Röhr, Thierry Conard, F. De Smedt, Stefan De Gendt, W. Storm, T. Bauer, Paul W. Mertens, Marc Heyns

Ultra-Thin Oxide Growth on Silicon Using Ozonated Solutions

Authors: F. De Smedt, Chris Vinckier, I. Cornelissen, Stefan De Gendt, Marc Meuris, G. Gilis, Marc Heyns