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Articles by author: F. De Smedt

• Can we Increase the Effiency of Organic Contamination Removal by Ozone/DI-Water Processes by Using Additives?
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p215)
• Determination of Photoresist Degradation Products in O₃/DI Processing
  Published in: Ultra Clean Processing of Silicon Surfaces V (p207)
• Effect of Additives on the Removal Efficiency of Photoresist by Ozone/DI-Water Processes: Experimental Study
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p101)
• Materials Compatibility and Organic Build-Up during Ozone-Based Cleaning of Semiconductor Devices
  Published in: Ultra Clean Processing of Silicon Surfaces V (p63)
• On the Application of a Thin Ozone Based Wet Chemical Oxide as an Interface for ALD High-k Deposition
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p19)
• Photoresist Stripping by Ozone/Water Processes: Effect of Additives
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p309)
• Surface Characterization after Different Wet Chemical Cleans
  Published in: Ultra Clean Processing of Silicon Surfaces V (p67)
• The Ozone Solubility and its Decay in Aqueous Solutions: Crucial Issues in Ozonated Chemistries for Semiconductor Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces V (p211)
• Ultra-Thin Oxide Growth on Silicon Using Ozonated Solutions
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p81)