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Articles by author: Leandro Raniero

• Batch Processing Method to Deposit a-Si:H Films by PECVD
  Published in: Advanced Materials Forum II (p104)
• Composition, Structure and Optical Characteristics of Polymorphous Silicon Films Deposited by PECVD at 27.12 MHz
  Published in: Advanced Materials Forum II (p100)
• Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by PECVD at 13.56 MHz
  Published in: Advanced Materials Forum II (p532)
• Influence of the Rapid Thermal Annealing on the Properties of Thin a-Si Films
  Published in: Advanced Materials Forum II (p108)
• Insights on Amorphous Silicon Nip and MIS 3D Position Sensitive Detectors
  Published in: Advanced Materials Forum III (p13)
• MIS Photodiodes of Polymorphous Silicon Deposited at Higher Growth Rates by 27.12 MHz PECVD Discharge
  Published in: Advanced Materials Forum II (p73)
• Multifunctional Thin Film Zinc Oxide Semiconductors: Application to Electronic Devices
  Published in: Advanced Materials Forum III (p3)
• Optical and Morphological Properties of Annealed PbS Thin Films Obtained from a Chemical Solution.
  Published in: Advanced Materials Forum II (p128)
• Role of Hydrogen Plasma on the Electrical and Optical Properties of Indium Zinc Transparent Conductive Oxide
  Published in: Advanced Materials Forum III (p63)
• Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition
  Published in: Advanced Materials Forum II (p112)
• Silicon Etching in CF₄/O₂ and SF₆ Atmospheres
  Published in: Advanced Materials Forum II (p120)
• Sputtering Preparation of Silicon Nitride Thin Films for Gate Dielectric Applications
  Published in: Advanced Materials Forum II (p69)
• The Study of High Temperature Annealing of a-SiC:H Films
  Published in: Advanced Materials Forum III (p18)