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Articles by author: Marcel Lux

• A Novel Resist and Post-Etch Residue Removal Process Using Ozonated Chemistry
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p165)
• Evaluation of Megasonic Cleaning for Sub-90nm Technologies
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p141)
• Impact of Trace Metals in Litho Chemicals
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p279)
• Improved Phosphoric Acid Mixtures for Nitride Strip
  Published in: Ultra Clean Processing of Silicon Surfaces V (p43)
• Modification of Photoresist by UV for Post-Etch Wet Strip Applications
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p323)
• Particle Deposition and Removal from Ge Wafers
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p173)
• Photoresist Characterization and Wet Strip after Low-k Dry Etch
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p325)
• Relation between Particle Density and Haze on a Wafer: a New Approach to Measuring Nano-Sized Particles
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p161)
• Single Chemistry Cleaning Solution for Advanced Wafer Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces V (p119)
• Single Chemistry Cleaning Solutions for Advanced Wafer Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p27)
• Use of Surfactants for Improved Particle Performance of dHF-Based Cleaning Recipes
  Published in: Ultra Clean Processing of Silicon Surfaces V (p263)
• Wafer Backside Cleaning Strategies for High-k/Metal Gate Processing
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p241)