Papers by Author: Naoki Wakiya

Abstract: LaNiO₃ (LNO) is known as a candidate for oxide electrodes with perovskite type crystal structure which is suitable for lattice matching with conventional perovskite ferroelectrics, Pb (Zr,Ti)O₃ (PZT), BaTiO₃ (BTO), etc. We have been investigating thermal expansion effects of the LNO film with PZT/LNO/Si and BTO/LNO/Si structures, where ferroelectric and piezoelectric properties are enhanced by a compressive thermals stress impressed from the LNO layer to the ferrelectric films. The ferroelectric films also shows high [00 orientation owing to [100] orientation of the LNO film. In the present study, further investigation of the LNO films prepared on Si substrates by CSD method is made by transmission electron microscopy (TEM) in order to understand self-orientation along [100] perpendicular to the film plane which effectively leads orientation of PZT films prepared on the LNO film. The results obviously indicates that the 1 layer deposited LNO film has almost no orientation, whereas it shows tendency of orientation of [100] perpendicular to the film plane when the layer number increased.

Abstract: This study examined effects of applying a magnetic field (up to 2 kG) on the magnetic properties of epitaxial NiFe₂O₄ (NF) thin films during deposition. The NF films were deposited on Y_0.15Zr_0.85O1.93 (YSZ) buffered Si (001) substrates using pulsed laser deposition (PLD). Although application of magnetic field during deposition affected neither the crystal structure nor orientation of the NF thin films, it improved magnetic properties. The saturation magnetization (Ms) of NF thin films deposited at 500°C and 600°C without application of a magnetic field was as low as 40 emu/g. However, that of NF deposited under magnetic field of 2 kG got to bulk Ms (50.3 emu/g). The TEM observation results revealed that the anti-phase boundary (APB) density decreased by application of the magnetic field during deposition. Results show that magnetic properties of NF thin films are controllable using the magnetic field during deposition.

Abstract: Highly oriented and polycrystalline Gd₂O₃ doped CeO₂ thin films were prepared on α-Al₂O₃(0001) substrates by chemical vapor deposition, using Ce(C₅H₄C₂H₅)₃ and Gd(C₅H₄C₂H₅)₃ as precursors. The compositions of the films were controlled by optimizing the vaporization pressure of Gd precursor under the constant vaporization condition of Ce precursor. In-plane electrical conductivities of the films at various temperatures and oxygen partial pressures were evaluated by electrochemical impedance spectroscopy measurements. The activation energy of the film was determined as 0.94 eV, which is comparable with that of pulsed laser deposited films.

Abstract: The effect of in-situ magnetic field during deposition (dynamic aurora PLD) was examined for SrTiO₃ thin film deposited on (La_0.5Sr_0.5)CoO₃/CeO₂ buffered YSZ(001) substrates. It was found that both in-plane and out-of-plane lattice parameters were changed by the in-situ magnetic field. Reciprocal space map measurement revealed that the in-plane and out-of-plane lattice parameters are 0.3817 and 0.3953 nm without magnetic field, meanwhile those are 0.3906 and 0.3974 nm with magnetic fields of 2 kG. This indicates that biaxial strain induced by the magnetic field. The effect of magnetic fields on the ferroelectric properties was examined.

Abstract: InN belongs to the III-group nitride materials and is known to have a low decomposition temperature which causes intractable grain growth compared to the other nitrides, GaN, AlN, etc. We prepared InNs with a flower-like shape as well as film structure by Atmospheric Pressure Halide CVD process, in which InN is synthesized by CVD under atmospheric pressure. In the present study, growth mechanisms of the flower structured InN prepared on Si(100) and a-plane sapphire substrates is reported.

Abstract: Thermal stability of bottom electrode thin films (La0.5Sr0.5)CoO3 (LSCO) and (La0.6Sr0.4)MnO3 (LSMO) were investigated. The crystallization and surface morphology of the heterostructure were characterized using x-ray diffraction and atomic force microscopy. Resistivity of the LSCO thin film was 25 cm. However, the resistivity of LSCO thin film increases sharply with annealing temperature. The LSMO thin film has high resistivity (100 mcm). The film does not decompose after thermal processing at 900 °C. To confirm thermal stability, we examined the effect of post annealing at various temperatures on the morphology and resistivity. Results showed that LSMO has higher thermal stability than that of LSCO.

Abstract: BaxSr1-xTiO3 (BST) thin films were deposited by modified CSD, in which partially hydrolyzed Ti-alkoxide was reacted with Ba-Sr precursor solution to form highly polymerized BST precursor solutions, leading to the better electrical properties of the resultant thin films. BST precursor solutions of 0.1 M were prepared to deposit BST thin layers of 17nm ~ 20nm for one dip-coating operation with different barium to strontium ratio of Ba/Sr = 90/10, 70/30 and 50/50. Modified CSD-derived BST thin films were deposited on a Si wafer with Pt electrode or CSD-derived LaNiO3 (LNO) seeding layer with preferred orientation. BST thin films exhibited ferroelectric or paraelectric properties, depending upon the Ba/Sr ratio. Better electrical properties for the BST thin films were observed on a LNO seeding layer. Maximum tunability of our BST film was 41 % at 1MHz.

Abstract: We investigated electrical properties of epitaxial Mn doped bismuth ferrite BiFe0.97Mn0.03O3 (BFMO) thin films with different crystal orientations deposited on Si substrates with appropriate buffer layers. Epitaxial SrRuO3 (SRO) thin films with (001), (101), and (111) orientations were grown on CeO2/yttria-stabilized zirconia (YSZ)/Si(001) substrates and YSZ/Si(001), respectively, by the insertion of MgO and TiO2 atomic layers using pulsed-laser deposition (PLD). Using spin coating, we deposited BFMO thin films onto orientated SRO thin films. The BFMO orientation followed the SRO orientation. The Pr values of the BFMO were ordered as follows {111}>{110}>{100}, which is the same as that predicted by crystallographic considerations. The largest Pr value of the {111} orientation is 76 μC/cm2 at 100 kHz, 25°C.

Abstract: Lithium niobate (LiNbO3) thin films were deposited on Al2O3(001) substrates using metal-organic chemical vapor deposition (MOCVD), with Li(dpm) and Nb(C2H5)5 as precursors. By optimizing the conditions of thin film deposition, the c-axis oriented and epitaxially grown LiNbO3 thin films with stoichiometric composition were deposited on an Al2O3(001) substrate. The refractive index of the stoichiometric LiNbO3 thin film was 2.24 at = 632.8 nm, which is close to that of bulk crystal.

Abstract: Thin films of HfO2 were fabricated on a p-Si(001) substrate using double pulse excitation (DPE) pulsed laser deposition (PLD) with KrF excimer and Nd:YAG lasers, and using conventional Nd:YAG laser PLD under two typical oxygen pressures (7.3 × 10-2 and 7.3 × 10-1 Pa). At 400°C or higher temperatures, the films are crystalline; at less than 400°C, they are amorphous. At higher oxygen pressures, DPE-PLD was effective against droplets. Then the surface morphology and electrical insulation properties of thin films were improved. At lower pressure, DPE-PLD was ineffective.