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Papers by Author: Serge Vanhaelemeersch

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HF Based Solutions for HfO₂ Removal; Effect of pH and Temperature on HfO₂: SiO₂ Etch Selectivity

Authors: Vasile Paraschiv, Martine Claes, Mikhail R. Baklanov, Werner Boullart, Stefan De Gendt, Serge Vanhaelemeersch

Resist Strip and Cu Diffusion Barrier Etch in Cu BEOL Integration Schemes in a Mattson Highlands^TM Chamber

Authors: G. Mannaert, Marc Van Cauwenberghe, M. Schmidt, Jan Van Aelst, D. Hendrickx, M. Stucchi, Thierry Conard, Serge Vanhaelemeersch, Werner Boullart

267

Silicon Surface Cleaning after Spacer Dry Etching

Authors: Denis Shamiryan, Mikhail R. Baklanov, Serge Vanhaelemeersch

303

Modification of Low-K SiCOH Film Porosity by a HF Solution

Authors: Denis Shamiryan, Mikhail R. Baklanov, Guy Vereecke, Serge Vanhaelemeersch, Karen Maex

135

Angle Resolved XPS Characterization of the Formation of Cl and Br Bonds in Poly-Silicon Etching and Its Cleaning

Authors: Y.B. Kim, B. Beckx, Serge Vanhaelemeersch, W. Vandervorst

153

The Optimization of the Cleaning to Remove Residual Bonds of Si-C and Si-F after Fluorocarbon Plasma Etch on the Silicon Surface

Authors: Y.B. Kim, Mikhail R. Baklanov, Thierry Conard, Serge Vanhaelemeersch, W. Vandervorst

291

Characterization of the Post Dry Etch Cleaning of the Silicon Surface Prior to Silicon Epitaxial Growth

Authors: Y.B. Kim, Matty Caymax, H. Bender, Serge Vanhaelemeersch

Post Dry-Etch Cleaning Issues of an Organic Low-K Dielectric

Authors: F. Lanckmans, Mikhail R. Baklanov, C. Alaerts, Serge Vanhaelemeersch, Karen Maex