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Articles by author: Steven Verhaverbeke

• A Novel Vapor Phase Etching Process for Si
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p239)
• Aqueous Based Single Wafer Cu/Low-k Cleaning Process Characterization and Integration into Dual Damascene Process Flow
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p353)
• Generation at Point-of-Use of BHF
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p267)
• Mechanism and Principles of Post Etch Al Cleaning with Inorganic Acids
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p363)
• Metallic Contamination Removal Evaluation for Single Wafer Processing
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p49)
• Surfactant Selection for AM Clean in a Single Wafer Oasis Wet System
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p57)
• Using Megasonics for Particle and Residue Removal in Single Wafer Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p151)
• Wet Cleaning of Trenches and Vias after Oxide/Nitride Dry Etch with Cu Exposed
  Published in: Ultra Clean Processing of Silicon Surfaces V (p311)