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Articles by author: Tadahiro Ohmi

• A Hydrogenated Water Application to Semiconductor Manufacturing
  Published in: Ultra Clean Processing of Silicon Surfaces V (p71)
• Construction of the Distribution System for Ozonized Water Used in the Wet Cleaning of Si Wafer Surface
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p161)
• Continuous Path Tracking System of High Precision Stage Using Synchronous Piezoelectric Device Driver
  Published in: AICAM 2005 (p121)
• Damage-Free Post-CMP Cleaning Solution for Low-k Fluorocarbon on Advanced Interconnects
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p381)
• Effect of Various Cleaning Solutions and Brush Scrubber Kinematics on the Frictional Attributes of Post Copper CMP Cleaning Process
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p363)
• Hydrogenated Ultrapure Water Production System for Future Wet Cleaning Process
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p7)
• Influence of the Dissolved Gas in Cleaning Solution on Silicon Wafer Cleaning Efficiency
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p43)
• Layer-By-Layer Oxidation of Silicon
  Published in: Ultra Clean Processing of Silicon Surfaces V (p139)
• Metal Wet Cleaning with No Corrosion: A Novel Approach
  Published in: Ultra Clean Processing of Silicon Surfaces V (p35)
• Metallic Impurity Contamination from Tungsten Gate Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p23)
• Particle Removal Mechanism of Hydrogenated Ultrapure Water with Megasonic Irradiation
  Published in: Ultra Clean Processing of Silicon Surfaces V (p245)
• Photo Resist Stripping Using an Alkaline Accelerator Containing Wet-Vapor
  Published in: Ultra Clean Processing of Silicon Surfaces V (p231)
• Potassium Adhesion to Various CVD Oxide and the Surface Cleaning with Hot UPW
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p67)
• Silicon Surface Cleaning for Low Temperature Silicon Epitaxial Growth
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p229)
• Surface Microroughness of Silicon in Wet Process and its Minimization
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p45)