HOME CONTACT My eBook

Username: Password:

> @scientific.net

Articles by author: Thierry Conard

• A Controlled Deposition of Organic Contamination and the Removal with Ozone Based Cleanings
  Published in: Ultra Clean Processing of Silicon Surfaces V (p223)
• A Study of the Influence of Typical Wet Chemical Treatments on the Germanium Wafer Surface
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p27)
• Advanced Metrologies for Cleans Characterization: ARXPS, GIXF and NEXAFS
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p281)
• Evaluation of Post Metal Etch Cleaning by Analyzing the Chemical Compositions and Distributions on the Etched Al Surface
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p177)
• Improved Phosphoric Acid Mixtures for Nitride Strip
  Published in: Ultra Clean Processing of Silicon Surfaces V (p43)
• On the Application of a Thin Ozone Based Wet Chemical Oxide as an Interface for ALD High-k Deposition
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p19)
• Resist Strip and Cu Diffusion Barrier Etch in Cu BEOL Integration Schemes in a Mattson Highlands^TM Chamber
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p267)
• Role of UV/Chlorine Exposure during Dry Surface Conditioning before Integrated Epi Deposition Process
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p233)
• Single-Wafer Wet Chemical Oxide Formation for Pre-ALD High-k Deposition on 300 mm Wafer
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p53)
• Surface Characterization after Different Wet Chemical Cleans
  Published in: Ultra Clean Processing of Silicon Surfaces V (p67)
• Surface Preparation Techniques for High-k Deposition on Ge Substrates
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p31)
• The Optimization of the Cleaning to Remove Residual Bonds of Si-C and Si-F after Fluorocarbon Plasma Etch on the Silicon Surface
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p291)
• The Origins of Fluorine in Dry Ultrathin Silicon Oxides
  Published in: Ultra Clean Processing of Silicon Surfaces V (p153)
• XPS Study of the Cleaning Efficiency by Ozone Processes of the Protective Films Formed by Reactive Ion Etching of Co and Ti Silicide
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p139)