Study of Two-Step Electroless Etched Si Nanowire Arrays
The influence of the nucleation process of Ag particles on the formation of Si nanowire arrays is investigated by two-stage electroless chemical etching. The dimensions of the Ag particles formed in the first stage of the process play an important role in the formation of the Si nanowires. The nucleation and etch result are analysed using SEM. The electrical properties of the resulting Si NW arrays are also studied.
C. B. Li et al., "Study of Two-Step Electroless Etched Si Nanowire Arrays", Applied Mechanics and Materials, Vols. 110-116, pp. 3284-3288, 2012