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Copper Indium Silicon Nanocomposite Thin Film Deposited by Magnetron Co-Sputtering
Abstract:
Thin CuInSi nanocomposite films were prepared by magnetron co-sputtering. The structures of CuInSi nanocomposite films were detected by X-ray diffraction (XRD); XRD studies of the annealed films indicate the presence of CuInSi, a peak at about 2θ=42.400°. The morphology of the film surface was studied by SEM. The nanocrystallization with needle shape of CuInSi could be seen clearly. The grain size is a few hundred angstroms.
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3289-3292
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October 2011
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© 2012 Trans Tech Publications Ltd. All Rights Reserved
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