The Formation of Diamond-Like Carbon Film at Atmospheric Pressure by the Pulsed Laser/Plasma Hybrid Deposition Method

Abstract:

A pulsed laser/plasma hybrid deposition method has been developed to produce the diamond-like carbon (DLC) film at atmospheric pressure in this work. A plasma torch was used to heat up the carbon particles which were simultaneously ablated by a pulsed laser, thus the kinetic energy of the carbon particle can be increased to form the carbon atoms with amorphous bonding structure of the DLC film. The influences of the plasma flow have been examined at various inlet pressures. According to the experimental results of the carbon film inspected by the Raman spectroscopy, it reveals that the intensity ratio of the D-band to G-band of the carbon film can be reduced to 0.5 by the implementation of plasma flow. Therefore the DLC film was solidly formed. The adhesive strength of the DLC film was also characterized by the scratch test, it can be found that the critical loading of the film on the iron substrate is up to 19 N.

• Periodical: Applied Mechanics and Materials (Volumes 110-116)
• Pages: 3737-3741
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.110-116.3737
• Online since: October 2011
• Authors: Han Pei Wang, Jehn Ming Lin
• Keywords: Diamond-Like Carbon (DLC), Plasma Flow, Pulsed Laser Deposition (PLD)

References

[1] B. F Coll, M. Chhowalla, Amorphous diamond film by enhanced arc deposition, Surface and Coatings Technology, 79 (1996) 76-86.

DOI: 10.1016/0257-8972(95)02444-1

[2] H. Han, F. Ryan, M. McClure, Ultra-thin tetrahedral amorphous carbon film as slider overcoat for high areal density magnetic recording, Surface and Coatings Technology, 120-121 (1999) 579 - 584.

DOI: 10.1016/s0257-8972(99)00448-x

[3] P. Yan, S. Yang, B. Li, Y. Ren, X. Chen, Deposition of diamond-like carbon films on an iron substrate by a pulsed high-density plasma beam at room temperature, Materials Chemistry and Physics, 45 (1996) 167-170.

DOI: 10.1016/0254-0584(96)80097-6

[4] T. Sato, S. Furuno, S. Iguchi, M. Hanabusa, Deposition of diamond-like carbon films by pulsed-laser evaporation, Jap. J. Appl. Phys., 26 (1987) 1487- 1488.

DOI: 10.1143/jjap.26.l1487

[5] S. S. Wagal, E. M. Juengerman, C. B. Collins, Diamond-like carbon films prepared with a laser ion beam, Appl. Phys. Lett., 53 (1988) 187-188.

DOI: 10.1063/1.100169

[6] Y. Liou, R. Weimer, D. Knight, R. Messier, Effect of oxygen in diamond deposition at low substrate temperatures, Applied Physics Letters, 56 (1990) 437-439.

DOI: 10.1063/1.102758

[7] P. T. Murray, Pulsed laser deposition of carbon films: dependence of film properties on laser wavelength, Journal of Electronic Material, 23 (1994) 855-859.

DOI: 10.1007/bf02655355

[8] D. Beeman, J. Silverman, R. Lynds, M. R. Anderson, Modeling studies of amorphous carbon, Phys. Rev. B, 30 (1984) 870-875.

DOI: 10.1103/physrevb.30.870

[9] T. V. Kononeko, V. I. Konov, E. N. Lubnin , F. Dausinger, Pulsed laser deposition of hard carbon coatings at atmospheric pressure, Quantum Electronics, 33 (2003) 189-191.

DOI: 10.1070/qe2003v033n03abeh002384

[10] T. V. Kononenko, E. N. Loubnin, F. Dausinger, D. Breitling, Pulsed laser deposition of hard coatings in atmospheric air, Applied Physics A: Materials Science and Processing, 79 (2004) 931-936.

DOI: 10.1007/s00339-004-2570-9

[11] Y. X. Leng, J. Y. Chen, P. Yang, H. Sun, G. J. Wan, N. Huang, Mechanical properties and platelet adhesion behavior of diamond-like carbon films synthesized by pulsed vacuum arc plasma deposition, Surface Science, 531 (2003)177-184.

DOI: 10.1016/s0039-6028(03)00487-4

[12] V.N. Vasilets, A. Hirose, Q. Yang, A. Singh, R. Sammynaiken, M. Foursa, Y.M. Shulga, Characterization of doped diamond-like carbon films deposited by hot wire plasma sputtering of graphite, Applied Physics A: Materials Science and Processing, 79 (2004).

DOI: 10.1007/s00339-004-2873-x

[13] T. Ono, Y. Suda, M. Akazawa, Y. Sakai, K. Suzuki, Effects of oxygen and substrate temperature on properties of amorphous carbon films fabricated by plasma-assisted pulsed laser deposition method, Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 41 (2002).

DOI: 10.1143/jjap.41.4651

[14] Y. Suda, T. Ono, M. Akazawa, Y. Sakai, J. Tsujino, N. Homma, Preparation of carbon nanoparticles by plasma-assisted pulsed laser deposition method - size and binding energy dependence on ambient gas pressure and plasma condition", Thin Solid Films, 415 (2002).

DOI: 10.1016/s0040-6090(02)00532-1

[15] M. Itoh, Y. Suda, M. A. Bratescu ,Y. Sakai, Plasma-assisted pulsed laser deposition of carbon films: effect of oxygen plasma on amorphous carbon film etching, Thin Solid Films, 419 (2006) 96-100.

DOI: 10.1016/j.tsf.2005.08.038

[16] C. Ferrari, J. Robertson, Interpretation of Raman spectra of disordered and amorphous carbon, Phys. Rev. B, 611 (2000) 4095-14107.

DOI: 10.1103/physrevb.61.14095