Effects of Negative Bias on the Structure of Ti Film and its Adhesiveness to the Base by Plasma

Qi Lai; Shuang Hua Huang; De Jun Lan; Min Zou; Xue Ping Luo

doi:10.4028/www.scientific.net/AMM.110-116.592

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 110-116Effects of Negative Bias on the Structure of Ti...

Effects of Negative Bias on the Structure of Ti Film and its Adhesiveness to the Base by Plasma

Abstract:

Ti film on AISI 201 was prepared by plasma. The film was characterized and analyzed by using a variety of analytical techniques, such as XRD, SEM and universal test machine. Ti films were deposited on AISI 201 stainless steel substrate, it was found that of Ti film has a different microstructure in various negative bias. And film density is connected with bias. When bias rose from the 15V to 100V, the film density increased from 3.82 g/cm³ to 4.28 g/cm³. After bias rose from the 100V to 180V, film density decreased from 4.28 g/cm³ to 4.13g/cm³. And also, due to the microstructural changes, the adhesiveness of Ti films at the AISI 201 increased from 1.16 MPa to maximum of 3.87 MPa, and then decreased. There is a similar maximum value of approximately 7.53 MPa at the AISI 304.

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Applied Mechanics and Materials (Volumes 110-116)

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592-595

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https://doi.org/10.4028/www.scientific.net/AMM.110-116.592

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October 2011

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Qi Lai, Shuang Hua Huang, De Jun Lan, Min Zou, Xue Ping Luo

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Adhesiveness, Film Density, Ti Film

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