Effects of Negative Bias on the Structure of Ti Film and its Adhesiveness to the Base by Plasma

Abstract:

Article Preview

Ti film on AISI 201 was prepared by plasma. The film was characterized and analyzed by using a variety of analytical techniques, such as XRD, SEM and universal test machine. Ti films were deposited on AISI 201 stainless steel substrate, it was found that of Ti film has a different microstructure in various negative bias. And film density is connected with bias. When bias rose from the 15V to 100V, the film density increased from 3.82 g/cm3 to 4.28 g/cm3. After bias rose from the 100V to 180V, film density decreased from 4.28 g/cm3 to 4.13g/cm3. And also, due to the microstructural changes, the adhesiveness of Ti films at the AISI 201 increased from 1.16 MPa to maximum of 3.87 MPa, and then decreased. There is a similar maximum value of approximately 7.53 MPa at the AISI 304.

Info:

Periodical:

Edited by:

Wu Fan

Pages:

592-595

DOI:

10.4028/www.scientific.net/AMM.110-116.592

Citation:

Q. Lai et al., "Effects of Negative Bias on the Structure of Ti Film and its Adhesiveness to the Base by Plasma", Applied Mechanics and Materials, Vols. 110-116, pp. 592-595, 2012

Online since:

October 2011

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.