Evaluation of the Mechanical Properties of Copper Thin Film and Copper Bulk at the Nano-Scale by Nanoindenter

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This study used the nanoindenter to perform indentation tests on copper bulk and nano copper film in order to discuss the mechanical properties of pure copper at the nano scale. This study tested 7 levels of load, ranging from 20 to 200 μN (load increment at 30 μN) for the indentation tests on copper bulk and nano copper film specimens. Results showed that the load was roughly proportional to the residual depth, in the case of flat nano copper film, while the relationship between the load and the residual depth was not significant in the case of unsmooth copper bulk. Moreover, the hardness of both the copper bulk and the nano copper film would increase along with increasing load, while the Er value change trends of both the copper bulk and the nano copper film specimens differed with increasing load.

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394-397

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October 2011

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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[1] H. Hertz, On the contact of elastic solids, J. Reine. Angew. Math. 92 (1882) 156-171.

Google Scholar

[2] D. Tabor, A simple theory of static and dynamic hardness, Proc. R. Soc. A192 (1948) 247-273.

Google Scholar

[3] J. N. Sneddon, The relation between load and penetration in the axisymmetric boussinesq problem for a punch of arbitrary profile, Int. J. Eng. Sci. 3 (1965) 47-57.

DOI: 10.1016/0020-7225(65)90019-4

Google Scholar

[4] W. C. Oliver, G. M. Pharr, An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments, J. Mater. Res. 7 (1992) 1564-1583.

DOI: 10.1557/jmr.1992.1564

Google Scholar

[5] G. M. Pharr, W. C. Oliver, F. R. Brotzen, On the generality of the relationship among contact stiffness, contact area, and elastic modulus during indentation, J. Mater. Res. 7 (1992) 613-617.

DOI: 10.1557/jmr.1992.0613

Google Scholar