Two Dimensional Ultrasonic Vibration Assisted Chemo-Mechanical Grinding of Si Wafer

Abstract:

Article Preview

As a new fixed-abrasive machining method, chemo-mechanical grinding (CMG) is developed from chemical mechanical polishing (CMP), with the obvious advantage of geometric accuracy determinacy and no slurry. To improve material removal rate and enhance the popularity of CMG, this paper introduces a combined grinding method, i.e., two dimensional ultrasonic vibration assisted CMG (2D-UACMG). Si wafer is taken as the workpiece and the influence of ultrasonic vibration modes and process parameters on the surface roughness and the material removal is examined. The results show 2D-UACMG can obtain better surface quality with little surface damage at nanometer level compared with the conventional CMG without the ultrasonic vibration.

Info:

Periodical:

Advanced Materials Research (Volumes 126-128)

Edited by:

Yunn-Shiuan Liao, Chao-Chang A. Chen, Choung-Lii Chao and Pei-Lum Tso

Pages:

282-288

DOI:

10.4028/www.scientific.net/AMR.126-128.282

Citation:

Z. Z. Wang et al., "Two Dimensional Ultrasonic Vibration Assisted Chemo-Mechanical Grinding of Si Wafer", Advanced Materials Research, Vols. 126-128, pp. 282-288, 2010

Online since:

August 2010

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.