Electrical Characterization of Inductively Coupled Plasma Reactor Excited by RF (13.56MHz)

Mohamed Mounis Alim; Mourad Zekara; Laid Henni; Rabah Tadjine; Karim Henda

doi:10.4028/www.scientific.net/AMR.227.185

Paper Titles

Study of the Adhesion and the Thermal Stability of CrN and CrAlN Thin Films
p.168

Dry Sliding Wear of Stainless Steel Coating Obtained by Plasma on Aluminium Substrate
p.173

Study of API 5L X52 Carbon Steel Treated in Oxygen Plasma Discharge
p.177

Influence of Plasma Parameters and Circuit Connecting on Harmonics Generated in Ar/O₂ 13.56 Mhz Plasma Discharge
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Electrical Characterization of Inductively Coupled Plasma Reactor Excited by RF (13.56MHz)
p.185

Experimental Study of Evolution of NO and NO₂ in a Positive Corona Discharge
p.189

Diagnostic of a RF (13.56MHz) Magnetron in Ar/CH₄ Discharge
p.195

Optical Properties of a-C:H Films Deposited by Plasma Microwave Discharge with Controlling Substrate Temperature
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Development of a Radiofrequency Plasma Diagnostic System with a Langmuir Probe and Study of a Capacitively Coupled Argon Plasma
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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 227Electrical Characterization of Inductively Coupled...

Electrical Characterization of Inductively Coupled Plasma Reactor Excited by RF (13.56MHz)

Abstract:

In the surface treatment by plasma, the saturation ion current is the macroscopic parameter which can give us information on the ionic density in plasma. For this, we followed the evolution of the saturation ion current versus the pressure and power. Our experimental setup consists of spherical plasma reactor linked with inductively source argon plasma and probe to measure ionic current. The obtained experimental results enabled us to highlight the effect of pressure and power on saturation ion current. We found in this study that the saturation ion current increases with pressure and presents an optimum depending on the power.

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Periodical:

Advanced Materials Research (Volume 227)

Pages:

185-188

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.227.185

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Online since:

April 2011

Authors:

Mohamed Mounis Alim, Mourad Zekara, Laid Henni, Rabah Tadjine, Karim Henda

Keywords:

Inductively Coupled, Ionic Current Saturation, Plasma, RF Discharge

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