Experimental Study of Evolution of NO and NO₂ in a Positive Corona Discharge

Abstract:

In this work, we present an experimental study of the reduction of NO and the creation of NO2 by positive corona discharge in N2/O2 mixture (95% N2, 5%O2), where 200ppm of NO are injected at atmospheric pressure. The corona discharge was generated using a wire- to- cylinder reactor. The applied voltage is 5kV and 7 kV and it was maintained for  50 minutes. Ultraviolet absorption spectroscopy operating in the wavelength range 190-330 nm was used to identify the species and quantify their concentration, According to Beer Lambert law who give concentration from absorbance. The temperature was maintained constant for 300K. The obtained resultant show nitrous oxide NO has been destroyed with the augmenta¬tion of corona current. We note different times to NO removal, 50 minutes at 5 kV and 20 minutes at 7 kV. And we observe the creation of NO2 and the apparition of ozone O3.

• Periodical: Advanced Materials Research (Volume 227)
• Pages: 189-194
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.227.189
• Online since: April 2011
• Authors: I.S. Medjahdi, M. Lemerini, Francisco Pontiga, H. Moreno, A.K. Ferouani, R.D. Medjahdi
• Keywords: Kinetic Chemical, N₂/O₂ /NO Mixture, Positive Corona Discharge, Removal NO, Ultraviolet Absorption

References

[1] H. Kim: Plasma Processes and Polymers, Vol. 1 (2004), p.91.

[2] D. J. Kim, Y. Choi, and K. S. Kim: Plasma Chemistry and Plasma Vol. 21, (2001), p.321.

[3] G. B. Zhao, J. Garikipati, X. Hu, C. Morris and M. Radosz: American Institute of Chemical Engineers, Vol. 51 (2005), p.1800.

[4] A.K. Ferouani, M. Lemerini, and I. S. Medjahdi: American Institute of Physics, Vol. 1047 (2008), p.232.

[5] C. Soria: Plasma Sources Sci, Technol. Vol. 13 (2004), p.95.

[6] K. Yanallah, S. Hadj ziane, A. Belasri and Y. Mesle: Journal of Molecular Structure, THEOCHEM. Vol. 77 (2006), p.125.

DOI: 10.1016/j.theochem.2006.08.005

[7] K. Yan, S. Kanazawa, T. Ohkubo, and Y. Nomoto: Plasma Chemistry and Plasma Processing, Vol. 19, (1999).

[8] I.S. Medjahdi, M. Lemerini, and A.K. Ferouani: International Review of Physique Vol. 2 (2008), p.291.

[9] F. Pontiga, H. Moreno A. Castellanos, M. Lemerini, and I. S. Medjahdi : 19th International Symposium on Plasma Chemistry. Ruhr- University Bochum, Germany, (2009), p.27.

[10] F. Pontiga, H, moreno, and A Castellanos : Annual report conference on electrical insulation and dielectric phenomena, (2007), p.671.

DOI: 10.1109/ceidp.2007.4451581

[11] F. Pontiga, A Castellanos: Annual report conference on electrical insulation and dielectric Phenomena, (2006), p.264.

[12] T. Mikoviny, S. Matejcik, B. Gulejova, and D. Skalny T. Mikoviny, S. Matejcik: American Institute Of Chemical Engineers, vol. 43 (2001), p.1652.

[13] O. Eichwald, N. Guntoro, M. yousfi, and M. Benhenni: J. Phys. D: Appl. Phys, Vol. 35 (2002), p.439.

[14] R. D. Hill, I. Rahmin, R. G. Rinker: Ind. Eng. Chem. Res, vol. 27 (1998), p.1264.

[15] K. Aritoshi, M. Fujiwara, and M. Ishida: J. Appl. Phys. Vol. 41 (2002), p.3936.