Modulation of Three Dimensional Photonic Band Gap in Visible Region

Y.P. Liu; Y.P. Guo; Z.J. Yan; C.M. Huang; Y.Y. Wang

doi:10.4028/www.scientific.net/AMR.31.20

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 31Modulation of Three Dimensional Photonic Band Gap...

Modulation of Three Dimensional Photonic Band Gap in Visible Region

Abstract:

Three dimensional (3D) SiO2 photonic crystals films were fabricated on quartz substrate by vertical deposition method. The effects of various preparation parameters on optical properties were studied by optical transmission measurements. Bragg reflection on parallel sets of (111) planes were observed in all the samples. The center wavelength of [111] photonic band gap (PBG) varied from 450 nm to 680 nm with the increasing sphere size. For a given sphere size, the (111) Bragg reflection of as-deposited sample shifted towards lower wavelengths as the sintering temperature T increased. The role of evaporation temperature on the optical properties of the film was also investigated. The PBG can be correspondingly modulated in visible region by changing various preparation parameters.

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Periodical:

Advanced Materials Research (Volume 31)

Pages:

20-22

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.31.20

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Online since:

November 2007

Authors:

Y.P. Liu, Y.P. Guo, Z.J. Yan, C.M. Huang, Y.Y. Wang

Keywords:

Photonic Band Gap, Photonic Crystal (PC), Vertical Deposition Method

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DOI: 10.1515/9783112460825-001

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