Low Frequency Noise Analysis in Advanced CMOS Devices

Jalal Jomaah; Majida Fadlallah; Gérard Ghibaudo

doi:10.4028/www.scientific.net/AMR.324.441

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 324Low Frequency Noise Analysis in Advanced CMOS...

Low Frequency Noise Analysis in Advanced CMOS Devices

Abstract:

A review of recent results concerning the low frequency noise in modern CMOS devices is given. The approaches such as the carrier number and the Hooge mobility fluctuations used for the analysis of the noise sources are illustrated through experimental data obtained on advanced CMOS generations. Furthermore, the impact on the electrical noise of the shrinking of CMOS devices in the deep submicron range is also shown.