The Influences of Annealing Temperatures on the Properties of the Sol-Gel Deposition SrBi4Ti4O15 Thin Films

Wen Cheng Tzou; Chien Chen Diao; Chao Chin Chan; Chia Ching Wu; Chang Fu Yang; Hung Chiuan Shiu

doi:10.4028/www.scientific.net/AMR.415-417.1855

Paper Titles

The Biocompatibility and Bioactivity of Gradient Composite Bioceramic Coating with Different Content of Nd₂O₃ Fabricated by Wide Band Laser Cladding
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The Application of High Pressure Electrostatic in Microcapsule Preparation
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Application of Ultrasonic Wave in Dyeing of Feather Fibers
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The Synthesis and Characterization of Nadic Dialkyl-Ester Derivatives with Trialkyl Borate
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The Influences of Annealing Temperatures on the Properties of the Sol-Gel Deposition SrBi₄Ti₄O₁₅ Thin Films
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Simulation of the Effect of Power on the Properties of Si-Based Films Deposited by PECVD
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Residual Stress and Dielectric Property of Al₂O₃ Films on N-Type Si-(100) Substrate
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Effects of Deposition Parameters and Annealing Temperatures on the Characteristics of the Sr_0.6Ba_0.4Nb₂O₆ Thin Films
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Effects of Deposition Temperatures on ZnO:Al Films Deposited on Polymer Substrates by RF Magnetron Sputtering
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The Influences of Annealing Temperatures on the Properties of the Sol-Gel Deposition SrBi₄Ti₄O₁₅ Thin Films

Abstract:

In this study, SrBi₄Ti₄O₁₅ (SBT) thin films were deposited onto the SiO₂/p-Si(100) and Pt/Ti/SiO₂/p-Si(100) substrates by using sol-gel method. After deposition, the SBT thin films were then heated by a rapid thermal annealing (RTA) process conducted in air for 1min at 600-800°C. The surface morphologies and the crystalline structures of the SBT thin films were investigated by using SEM and XRD patterns. The grain sizes increased and the pores decreased with rising RTA temperature. In addition, the coercive field decreased and the remanent polarization and saturation polarization increased with rising RTA temperature. The lnJ-E^1/2 curves of the SBT thin films were also investigated to find the leakage current mechanisms correspond either to the Schottky emission or to the Poole-Frenkel emission.